Inventor · disambiguated record
Kouichiro Inazawa
Also filed as: INAZAWA KOUICHIRO
12 granted patents·547 citations·filing 1995–2003
93Inventor score
Files withTOKYO ELECTRON LTD12
Top patents by PatentIndex Score
12 records- 0197US6089181APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Jul 18, 2000·201 cites·12 claims
- 0296US6642149B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Nov 4, 2003·92 cites·18 claims
- 0387US6159862ASemiconductor processing method and system using C5 F8TOKYO ELECTRON LTD·Filed 1998·Granted Dec 12, 2000·86 cites·12 claims
- 0486US7169440B2Method for removing photoresist and etch residuesTOKYO ELECTRON LTD·Filed 2002·Granted Jan 30, 2007·38 cites·38 claims
- 0575US6737350B1Method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2000·Granted May 18, 2004·22 cites·9 claims
- 0672US5721090AMethod of etching a substrateTOKYO ELECTRON LTD·Filed 1995·Granted Feb 24, 1998·49 cites·7 claims
- 0765US6849559B2Method for removing photoresist and etch residuesTOKYO ELECTRON LTD·Filed 2002·Granted Feb 1, 2005·10 cites·38 claims
- 0861US6465359B2Etchant for use in a semiconductor processing method and systemTOKYO ELECTRON LTD·Filed 1999·Granted Oct 15, 2002·22 cites·5 claims
- 0958US7465673B2Method and apparatus for bilayer photoresist dry developmentTOKYO ELECTRON LTD·Filed 2003·Granted Dec 16, 2008·7 cites·14 claims
- 1057US6488863B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2001·Granted Dec 3, 2002·8 cites·20 claims
- 1137US6753263B1Etching methodTOKYO ELECTRON LTD·Filed 1999·Granted Jun 22, 2004·8 cites·8 claims
- 1232US6602435B1Etching methodTOKYO ELECTRON LTD·Filed 1998·Granted Aug 5, 2003·4 cites·10 claims
Join the waitlist — get patent alerts
Get an alert when Kouichiro Inazawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →