Inventor · disambiguated record
Koji Kagawa
Also filed as: KAGAWA KOJI
13 granted patents·8 pending applications·12 citations·filing 2016–2024
85Inventor score
Files withTOKYO ELECTRON LTD21
Top patents by PatentIndex Score
21 records- 0184US10381233B2Method and apparatus for substrate processingTOKYO ELECTRON LTD·Filed 2017·Granted Aug 13, 2019·5 cites·11 claims
- 0281US11551941B2Substrate cleaning methodTOKYO ELECTRON LTD·Filed 2020·Granted Jan 10, 2023·1 cites·2 claims
- 0378US11306249B2Substrate processing method, substrate processing device and etching liquidTOKYO ELECTRON LTD·Filed 2019·Granted Apr 19, 2022·2 cites·12 claims
- 0478US10121646B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Nov 6, 2018·2 cites·7 claims
- 0577US11049723B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jun 29, 2021·1 cites·10 claims
- 0669US9870914B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 16, 2018·1 cites·7 claims
- 0767US2024222157A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0863US12203021B2Substrate processing device and etching liquidTOKYO ELECTRON LTD·Filed 2022·Granted Jan 21, 2025·0 cites·2 claims
- 0959US12506012B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Dec 23, 2025·0 cites·17 claims
- 1058US12020943B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jun 25, 2024·0 cites·14 claims
- 1155US2021305066A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1252US2025132164A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1352US2024307821A1Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1451US2018330971A1Substrate cleaning apparatus and substrate cleaning methodTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1550US11626294B2Substrate processing method, substrate processing apparatus and recording mediumTOKYO ELECTRON LTD·Filed 2020·Granted Apr 11, 2023·0 cites·8 claims
- 1649US10985026B2Substrate processing method, substrate processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2019·Granted Apr 20, 2021·0 cites·2 claims
- 1748US2022068642A1Substrate processing method and substrate processing deviceTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1847US2024128307A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1946US11875991B2Substrate treatment method and substrate treatment deviceTOKYO ELECTRON LTD·Filed 2019·Granted Jan 16, 2024·0 cites·7 claims
- 2046US2022316059A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2143US11551931B2Substrate processing apparatus, substrate processing method, and storage medium storing program for executing substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Jan 10, 2023·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →