Inventor · disambiguated record
Kouzou Kanagawa
Also filed as: KANAGAWA KOUZOU
11 granted patents·4 pending applications·52 citations·filing 2000–2024
84Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD15
Top patents by PatentIndex Score
15 records- 0192US11978644B2Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Granted May 7, 2024·2 cites·8 claims
- 0281US12183613B2Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Dec 31, 2024·1 cites·19 claims
- 0377US6332724B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Dec 25, 2001·24 cites·19 claims
- 0476US6736556B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted May 18, 2004·24 cites·10 claims
- 0573US2025087515A1Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0670US11430675B2Substrate processing apparatus and processing liquid reuse methodTOKYO ELECTRON LTD·Filed 2019·Granted Aug 30, 2022·1 cites·13 claims
- 0765US11469114B2Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Oct 11, 2022·0 cites·9 claims
- 0850US12042815B2Substrate processing apparatus for supplying gas of water repellent agent and substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 23, 2024·0 cites·5 claims
- 0950US2022152780A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1048US12087599B2Substrate processing apparatus and apparatus cleaning methodTOKYO ELECTRON LTD·Filed 2020·Granted Sep 10, 2024·0 cites·16 claims
- 1147US11476130B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·0 cites·16 claims
- 1246US11745213B2Substrate processing apparatus and apparatus cleaning methodTOKYO ELECTRON LTD·Filed 2020·Granted Sep 5, 2023·0 cites·17 claims
- 1346US11615971B2Substrate processing apparatus and processing liquid concentration methodTOKYO ELECTRON LTD·Filed 2019·Granted Mar 28, 2023·0 cites·16 claims
- 1442US2007074745A1Exhaust system for use in processing a substrateTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 1533US2017032983A1Substrate processing apparatus, substrate processing method, maintenance method of substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →