Inventor · disambiguated record
Koichi Nagami
Also filed as: NAGAMI KOICHI
40 granted patents·11 pending applications·622 citations·filing 1980–2025
97Inventor score
Top patents by PatentIndex Score
51 records- 0198US9761419B2Method for controlling potential of susceptor of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Sep 12, 2017·70 cites·9 claims
- 0297US10707053B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jul 7, 2020·40 cites·5 claims
- 0397US10593519B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Mar 17, 2020·45 cites·7 claims
- 0497US10553407B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 4, 2020·47 cites·14 claims
- 0597US10176971B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jan 8, 2019·39 cites·14 claims
- 0697US9941098B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Apr 10, 2018·34 cites·6 claims
- 0797US9870898B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Jan 16, 2018·48 cites·4 claims
- 0897US9754768B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Sep 5, 2017·59 cites·10 claims
- 0996US11387077B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 12, 2022·3 cites·13 claims
- 1096US10109461B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Oct 23, 2018·41 cites·12 claims
- 1196US9734992B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Aug 15, 2017·43 cites·12 claims
- 1296US9355822B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted May 31, 2016·67 cites·7 claims
- 1393US9663858B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted May 30, 2017·47 cites·9 claims
- 1492US12243723B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Mar 4, 2025·2 cites·3 claims
- 1591US11646181B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted May 9, 2023·2 cites·19 claims
- 1689US11170979B2Plasma etching method and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Nov 9, 2021·4 cites·17 claims
- 1789US10431433B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Oct 1, 2019·7 cites·12 claims
- 1887US11251048B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Feb 15, 2022·2 cites·19 claims
- 1985US11887817B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Jan 30, 2024·1 cites·13 claims
- 2085US2025357084A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2184US12154793B2Etching apparatus and etching methodTOKYO ELECTRON LTD·Filed 2020·Granted Nov 26, 2024·1 cites·20 claims
- 2282US12400832B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2023·Granted Aug 26, 2025·0 cites·12 claims
- 2382US10763126B2Etching apparatus and etching methodTOKYO ELECTRON LTD·Filed 2019·Granted Sep 1, 2020·2 cites·8 claims
- 2479US12437970B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Oct 7, 2025·0 cites·15 claims
- 2578US10250217B2Method for impedance matching of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Apr 2, 2019·2 cites·5 claims
- 2678US9736921B2Method for impedance matching of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Aug 15, 2017·3 cites·7 claims
- 2776US2025022684A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2876US2025191877A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2975US12033832B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jul 9, 2024·0 cites·19 claims
- 3070US9960016B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2017·Granted May 1, 2018·1 cites·5 claims
- 3170US2023411128A1Plasma processing apparatus and power supply control methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3269US10615005B2Plasma generating methodTOKYO ELECTRON LTD·Filed 2019·Granted Apr 7, 2020·1 cites·6 claims
- 3368US12136535B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Nov 5, 2024·0 cites·16 claims
- 3465US12261027B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Mar 25, 2025·0 cites·19 claims
- 3565US11764034B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 19, 2023·0 cites·11 claims
- 3663US12255049B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Mar 18, 2025·0 cites·22 claims
- 3762US2025178709A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 3861US2024297054A1Substrate processing apparatus, substrate processing system, electrical power supply system, and electrical power supply methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3960US2024290577A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4057US12033833B2Filter circuit and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jul 9, 2024·0 cites·19 claims
- 4156US10269539B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Apr 23, 2019·0 cites·8 claims
- 4255US11776795B2Plasma processing apparatus and power supply control methodTOKYO ELECTRON LTD·Filed 2019·Granted Oct 3, 2023·0 cites·12 claims
- 4352US2023056323A1Plasma processing apparatus and etching methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 4449US2025201519A1Plasma processing apparatus and method of controlling source frequency of source radio frequency powerTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 4547US2021343503A1Etching apparatus and etching methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 4646US11764082B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Sep 19, 2023·0 cites·12 claims
- 4746US11594398B2Apparatus and method for plasma processingTOKYO ELECTRON LTD·Filed 2020·Granted Feb 28, 2023·0 cites·12 claims
- 4845US4277383AAqueous cationic thermosetting urethane resin coating compositionsDAINIPPON TORYO KK·Filed 1980·Granted Jul 7, 1981·11 cites·7 claims
- 4937US9824864B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Nov 21, 2017·0 cites·6 claims
- 5037US9805917B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Oct 31, 2017·0 cites·5 claims
Showing the top 50 of 51 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →