Inventor · disambiguated record
Kota Oikawa
Also filed as: OIKAWA KOTA
3 granted patents·9 pending applications·12 citations·filing 2005–2025
61Inventor score
Files withTOKYO ELECTRON LTD5TDK CORP3MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1MITSUHASHI RIICHIRO1OIKAWA KOTA1
Top patents by PatentIndex Score
12 records- 0189US9768062B1Method for forming low parasitic capacitance source and drain contactsSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Sep 19, 2017·8 cites·20 claims
- 0266US2025299878A1Coil component and method of manufacturing the sameTDK CORP·Filed 2025·Application pending·0 cites
- 0365US7446048B2Dry etching apparatus and dry etching methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Nov 4, 2008·4 cites·11 claims
- 0464US2025273388A1Coil componentTDK CORP·Filed 2025·Application pending·0 cites
- 0563US12488990B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Dec 2, 2025·0 cites·16 claims
- 0660US2025364265A1Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0757US2024120140A1Multilayer coil componentTDK CORP·Filed 2023·Application pending·0 cites
- 0853US2024071727A1Substrate processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0949US2025210370A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1047US2024112927A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1136US2007181954A1Semiconductor device and method of manufacture thereofOIKAWA KOTA·Filed 2007·Application pending·0 cites
- 1234US2008237728A1Semiconductor device and method for manufacturing the sameMITSUHASHI RIICHIRO·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →