Inventor · disambiguated record
Kouichi Sekido
Also filed as: SEKIDO KOUICHI
4 granted patents·2 pending applications·1 citations·filing 2018–2021
55Inventor score
Files withTOKYO ELECTRON LTD6
Top patents by PatentIndex Score
6 records- 0167US10870919B2Gas supply method and film forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Dec 22, 2020·1 cites·5 claims
- 0249US11873556B2Raw material supply apparatus and film forming apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jan 16, 2024·0 cites·14 claims
- 0345US2021010130A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 0440US11753719B2Flow rate control method, flow rate control device, and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Sep 12, 2023·0 cites·8 claims
- 0540US2023129351A1Gas supply amount calculation method and semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 0632US11236425B2Method of processing substrateTOKYO ELECTRON LTD·Filed 2018·Granted Feb 1, 2022·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →