Inventor · disambiguated record
Kosuke Takai
Also filed as: TAKAI KOSUKE
21 granted patents·11 pending applications·12 citations·filing 2008–2024
89Inventor score
Top patents by PatentIndex Score
32 records- 0189US10018904B2EUV mask and method for manufacturing sameTOSHIBA MEMORY CORP·Filed 2016·Granted Jul 10, 2018·5 cites·15 claims
- 0278US7932002B2Reflection-type mask and method of making the reflection-type maskTOSHIBA KK·Filed 2009·Granted Apr 26, 2011·5 cites·18 claims
- 0374US9280044B2Light-reflective photomask and mask blank for EUV exposure, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2013·Granted Mar 8, 2016·2 cites·17 claims
- 0470US2023019111A1Substrate processing apparatusKIOXIA CORP·Filed 2022·Application pending·0 cites
- 0566US11776823B2Substrate processing method and substrate processing apparatusKIOXIA CORP·Filed 2022·Granted Oct 3, 2023·0 cites·14 claims
- 0665US2020147655A1Substrate processing apparatusTOSHIBA MEMORY CORP·Filed 2019·Application pending·0 cites
- 0763US11682566B2Processing apparatus for processing substrates of different typesKIOXIA CORP·Filed 2021·Granted Jun 20, 2023·0 cites·15 claims
- 0862US2024427228A1Photomask blank, photomask, and manufacturing method of photomaskKIOXIA CORP·Filed 2024·Application pending·0 cites
- 0959US11796910B2Template, manufacturing method of templateKIOXIA CORP·Filed 2021·Granted Oct 24, 2023·0 cites·4 claims
- 1057US12326660B2Pattern forming method, combined processing apparatus, and recording mediumKIOXIA CORP·Filed 2022·Granted Jun 10, 2025·0 cites·11 claims
- 1157US11443963B2Substrate processing method and substrate processing apparatusKIOXIA CORP·Filed 2019·Granted Sep 13, 2022·0 cites·12 claims
- 1256US8007960B2Light reflecting mask, exposure apparatus, and measuring methodTOSHIBA KK·Filed 2009·Granted Aug 30, 2011·0 cites·7 claims
- 1355US2024096653A1Substrate treatment apparatus and method for treating substrateSHIBAURA MECHATRONICS CORP·Filed 2023·Application pending·0 cites
- 1454US12068244B2Semiconductor device, template, and method of manufacturing templateKIOXIA CORP·Filed 2021·Granted Aug 20, 2024·0 cites·10 claims
- 1551US11579537B2Pattern inspection method and photomask fabrication methodKIOXIA CORP·Filed 2021·Granted Feb 14, 2023·0 cites·20 claims
- 1651US9507251B2Method for manufacturing reflective mask and apparatus for manufacturing reflective maskSHIBAURA MECHATRONICS CORP·Filed 2014·Granted Nov 29, 2016·0 cites·10 claims
- 1750US11275305B2Method for producing photomask, method for producing semiconductor device, method for forming pattern, and photomaskKIOXIA CORP·Filed 2020·Granted Mar 15, 2022·0 cites·14 claims
- 1850US2019221452A1Processing apparatusTOSHIBA MEMORY CORP·Filed 2018·Application pending·0 cites
- 1949US10012896B2Lithography mask production method and lithography mask production systemTOSHIBA MEMORY CORP·Filed 2016·Granted Jul 3, 2018·0 cites·11 claims
- 2048US11249391B2Exposure mask and manufacturing method of sameKIOXIA CORP·Filed 2018·Granted Feb 15, 2022·0 cites·16 claims
- 2148US2011286002A1Light reflecting mask, exposure apparatus, and measuring methodTAKAI KOSUKE·Filed 2011·Application pending·0 cites
- 2248US2022082933A1Original plate and method of manufacturing the sameKIOXIA CORP·Filed 2021·Application pending·0 cites
- 2347US9846357B2Photomask manufacturing method and photomaskTOSHIBA MEMORY CORP·Filed 2014·Granted Dec 19, 2017·0 cites·25 claims
- 2446US10698311B2Reflection-type exposure maskTOSHIBA MEMORY CORP·Filed 2017·Granted Jun 30, 2020·0 cites·21 claims
- 2545US11123774B2Substrate processing method, substrate processing apparatus, and composite processing apparatusTOSHIBA MEMORY CORP·Filed 2019·Granted Sep 21, 2021·0 cites·5 claims
- 2644US2021302830A1Method of manufacturing template, template, and method of manufacturing semiconductor deviceKIOXIA CORP·Filed 2020·Application pending·0 cites
- 2744US2008268352A1Light reflection mask, method of manufacturing the same and semiconductor deviceTAKAI KOSUKE·Filed 2008·Application pending·0 cites
- 2842US11185895B2Substrate processing method, substrate processing apparatus, and composite processing apparatusTOSHIBA MEMORY CORP·Filed 2019·Granted Nov 30, 2021·0 cites·5 claims
- 2940US9946150B2Light reflection type lithography mask, its manufacturing method, mask data generation method and mask blankTOSHIBA MEMORY CORP·Filed 2015·Granted Apr 17, 2018·0 cites·13 claims
- 3039US8702901B2Method for manufacturing reflective mask and apparatus for manufacturing reflective maskYOSHIMORI TOMOAKI·Filed 2011·Granted Apr 22, 2014·0 cites·12 claims
- 3138US2017074802A1Defect inspection method and defect inspection deviceTOSHIBA KK·Filed 2016·Application pending·0 cites
- 3231US2016266058A1Reflective Photomask, Method for Inspecting Same and Mask BlankTOSHIBA KK·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →