Inventor · disambiguated record
Koji Takayanagi
Also filed as: TAKAYANAGI KOJI
36 granted patents·3 pending applications·132 citations·filing 2008–2023
96Inventor score
Files withTOKYO ELECTRON LTD26RENESAS ELECTRONICS CORP8YOSHIHARA KOUSUKE3ICHINO KATSUNORI1TAKAYANAGI KOJI1
Top patents by PatentIndex Score
39 records- 0195US11273464B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Mar 15, 2022·10 cites·12 claims
- 0291US9948283B2Semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2017·Granted Apr 17, 2018·8 cites·20 claims
- 0390US9162247B2Coating and development treatment system with airflow control including control unit and movable airflow control plateYOSHIHARA KOUSUKE·Filed 2012·Granted Oct 20, 2015·11 cites·7 claims
- 0488US10838311B2Coating and developing apparatus and coating and developing methodTOKYO ELECTRON LTD·Filed 2019·Granted Nov 17, 2020·7 cites·13 claims
- 0587US9846363B2Processing liquid supplying apparatus and method of supplying processing liquidTOKYO ELECTRON LTD·Filed 2014·Granted Dec 19, 2017·7 cites·4 claims
- 0686USD610176SCoater cupTOKYO ELECTRON LTD·Filed 2009·Granted Feb 16, 2010·37 cites·1 claims
- 0785US11342198B2Processing liquid supplying apparatus and processing liquid supplying methodTOKYO ELECTRON LTD·Filed 2018·Granted May 24, 2022·3 cites·19 claims
- 0882US9991140B2Substrate heating device, substrate heating method and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jun 5, 2018·3 cites·11 claims
- 0982US8304018B2Coating methodTAKAYANAGI KOJI·Filed 2010·Granted Nov 6, 2012·8 cites·9 claims
- 1080US10734251B2Liquid processing apparatus, liquid processing method, and storage medium for liquid processTOKYO ELECTRON LTD·Filed 2013·Granted Aug 4, 2020·5 cites·8 claims
- 1179US9948090B2Semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2015·Granted Apr 17, 2018·2 cites·11 claims
- 1279US8414972B2Coating treatment method, coating treatment apparatus, and computer-readable storage mediumYOSHIHARA KOUSUKE·Filed 2008·Granted Apr 9, 2013·5 cites·8 claims
- 1379US8375887B2Solution treatment apparatus, solution treatment method and resist coating methodTOKYO ELECTRON LTD·Filed 2010·Granted Feb 19, 2013·5 cites·4 claims
- 1477US10062669B2Semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2016·Granted Aug 28, 2018·2 cites·14 claims
- 1577US9947534B2Coating treatment method with airflow control, and non-transitory recording medium having program recorded thereon for executing coating treatment with airflow controlTOKYO ELECTRON LTD·Filed 2015·Granted Apr 17, 2018·2 cites·4 claims
- 1676US11062899B2Coated film removing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jul 13, 2021·3 cites·8 claims
- 1775US9732910B2Processing-liquid supply apparatus and processing-liquid supply methodTOKYO ELECTRON LTD·Filed 2014·Granted Aug 15, 2017·3 cites·20 claims
- 1873US10256122B2Substrate heating methodTOKYO ELECTRON LTD·Filed 2018·Granted Apr 9, 2019·1 cites·5 claims
- 1972US10074546B2Processing liquid supplying apparatus and processing liquid supplying methodTOKYO ELECTRON LTD·Filed 2014·Granted Sep 11, 2018·2 cites·6 claims
- 2072US9508574B2Process liquid supply apparatus operating method, process liquid supply apparatus and non-transitory storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Nov 29, 2016·2 cites·5 claims
- 2171US9576934B2Semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2013·Granted Feb 21, 2017·2 cites·16 claims
- 2270US9576829B1Process liquid supply apparatus operating method, process liquid supply apparatus and non-transitory storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Feb 21, 2017·1 cites·6 claims
- 2369US2024085813A1Solution treatment apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2468US10236868B2Semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2018·Granted Mar 19, 2019·1 cites·20 claims
- 2567US8318247B2Coating treatment method, coating treatment apparatus, and computer-readable storage mediumYOSHIHARA KOUSUKE·Filed 2008·Granted Nov 27, 2012·2 cites·2 claims
- 2663US11868057B2Solution treatment apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2021·Granted Jan 9, 2024·0 cites·19 claims
- 2758US10396549B2Semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2018·Granted Aug 27, 2019·0 cites·10 claims
- 2857US11088111B2Semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2018·Granted Aug 10, 2021·0 cites·12 claims
- 2955US10974181B2Filter unit pretreatment method, treatment liquid supply apparatus, filter unit heating apparatus, and treatment liquid supply passage pretreatment methodTOKYO ELECTRON LTD·Filed 2019·Granted Apr 13, 2021·0 cites·7 claims
- 3053US10493387B2Filter unit pretreatment method, treatment liquid supply apparatus, filter unit heating apparatus, and treatment liquid supply passage pretreatment methodTOKYO ELECTRON LTD·Filed 2014·Granted Dec 3, 2019·0 cites·8 claims
- 3152US8851011B2Coating treatment method, coating treatment apparatus, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Oct 7, 2014·0 cites·8 claims
- 3251US12362743B2Semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2023·Granted Jul 15, 2025·0 cites·13 claims
- 3351US12257611B2Cleaning jig, coating apparatus, and cleaning methodTOKYO ELECTRON LTD·Filed 2021·Granted Mar 25, 2025·0 cites·10 claims
- 3451US10268116B2Processing liquid supplying apparatus and method of supplying processing liquidTOKYO ELECTRON LTD·Filed 2017·Granted Apr 23, 2019·0 cites·9 claims
- 3550US11862485B2Nozzle standby device, liquid processing apparatus and operation method of liquid processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jan 2, 2024·0 cites·15 claims
- 3650US9165763B2Coating treatment methodTOKYO ELECTRON LTD·Filed 2013·Granted Oct 20, 2015·0 cites·3 claims
- 3746US2009181174A1Method of treating substrate and computer storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3846US2015151227A1Filter deviceTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3938US8501274B2Coating treatment method, computer storage medium, and coating treatment apparatusICHINO KATSUNORI·Filed 2010·Granted Aug 6, 2013·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →