Inventor · disambiguated record
Koen Van Ingen Schenau
Also filed as: VAN INGEN SCHENAU KOEN
9 granted patents·1 pending application·54 citations·filing 2003–2010
85Inventor score
Files withASML NETHERLANDS BV6VAN INGEN SCHENAU KOEN2LOOPSTRA ERIK ROELOF1VAN SCHOOT JAN BERNARD PLECHELMUS1
Top patents by PatentIndex Score
10 records- 0190US9052605B2Illumination system for lithographic apparatus with control system to effect an adjustment of an imaging parameterVAN INGEN SCHENAU KOEN·Filed 2010·Granted Jun 9, 2015·10 cites·25 claims
- 0288US7443486B2Method for predicting a critical dimension of a feature imaged by a lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Oct 28, 2008·13 cites·35 claims
- 0385US9170500B2Lithographic apparatus and device manufacturing method with corrective positioning of reflective elementVAN SCHOOT JAN BERNARD PLECHELMUS·Filed 2010·Granted Oct 27, 2015·10 cites·10 claims
- 0482US7736820B2Anti-reflection coating for an EUV maskASML NETHERLANDS BV·Filed 2006·Granted Jun 15, 2010·9 cites·64 claims
- 0565US7307687B2Lithographic apparatus, device manufacturing method and substrateASML NETHERLANDS BV·Filed 2006·Granted Dec 11, 2007·2 cites·14 claims
- 0661US7042550B2Device manufacturing method and computer programASML NETHERLANDS BV·Filed 2003·Granted May 9, 2006·8 cites·19 claims
- 0744US2008160458A1Lithographic device manufacturing method, lithographic cell, and computer program productASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 0843US9134629B2Illumination system, lithographic apparatus and method of forming an illumination modeLOOPSTRA ERIK ROELOF·Filed 2010·Granted Sep 15, 2015·0 cites·24 claims
- 0937US8304180B2Lithographic apparatus and device manufacturing methodVAN INGEN SCHENAU KOEN·Filed 2004·Granted Nov 6, 2012·2 cites·21 claims
- 1036US7088421B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Aug 8, 2006·0 cites·25 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →