Inventor · disambiguated record
Kosuke Yoshihara
Also filed as: YOSHIHARA KOSUKE
16 granted patents·4 pending applications·424 citations·filing 1995–2025
93Inventor score
Top patents by PatentIndex Score
20 records- 0192US6004047AMethod of and apparatus for processing photoresist, method of evaluating photoresist film, and processing apparatus using the evaluation methodTOKYO ELECTRON LTD·Filed 1998·Granted Dec 21, 1999·127 cites·22 claims
- 0289US6117486APhotoresist coating method and apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Sep 12, 2000·76 cites·20 claims
- 0388US11693319B2Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2021·Granted Jul 4, 2023·1 cites·19 claims
- 0487US11407005B2Coating method, coating apparatus and recording mediumTOKYO ELECTRON LTD·Filed 2020·Granted Aug 9, 2022·2 cites·12 claims
- 0583US6281145B1Apparatus and method for applying process solutionTOKYO ELECTRON LTD·Filed 1999·Granted Aug 28, 2001·62 cites·12 claims
- 0682US6620244B2Resist film forming method and resist coating apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Sep 16, 2003·18 cites·2 claims
- 0782US5689749AApparatus for developing a resist-coated substrateTOKYO ELECTRON LTD·Filed 1995·Granted Nov 18, 1997·68 cites·13 claims
- 0878US11065639B2Coating treatment method, computer storage medium and coating treatment apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jul 20, 2021·2 cites·9 claims
- 0975US6821550B2Apparatus and method for applying process solutionTOKYO ELECTRON LTD·Filed 2001·Granted Nov 23, 2004·16 cites·11 claims
- 1070US2025321490A1Substrate treatment method, substrate treatment apparatus, and computer storage mediumTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1169US11938511B2Coating method, coating apparatus and recording mediumTOKYO ELECTRON LTD·Filed 2022·Granted Mar 26, 2024·0 cites·5 claims
- 1267US6410194B1Resist film forming method and resist coating apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jun 25, 2002·21 cites·5 claims
- 1365US5826130AApparatus and method for developing resist coated on substrateTOKYO ELECTRON LTD·Filed 1997·Granted Oct 20, 1998·29 cites·6 claims
- 1462US8453599B2Resist solution supply apparatus, resist solution supply method, and computer storage mediumYOSHIHARA KOSUKE·Filed 2010·Granted Jun 4, 2013·2 cites·7 claims
- 1553US2024120217A1Substrate treatment method, substrate treatment apparatus, and computer storage mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1652US2024249951A1Substrate treatment method, substrate treatment apparatus, and computer storage mediumTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1749US12216406B2Coating method and coating apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Feb 4, 2025·0 cites·15 claims
- 1837US2015186337A1Electronic document generation device and electronic document generation programTANAKA JUN·Filed 2012·Application pending·0 cites
- 1934US10666726B2Data processing system, and program for managing dataTANAKA JUN·Filed 2012·Granted May 26, 2020·0 cites·8 claims
- 2031US9846715B2Address/latitude and longitude converting device and geographical information system using the sameWINGARC1ST INC·Filed 2015·Granted Dec 19, 2017·0 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →