Inventor · disambiguated record
Kunie Ogata
Also filed as: OGATA KUNIE
36 granted patents·2 pending applications·758 citations·filing 1997–2012
98Inventor score
Top patents by PatentIndex Score
38 records- 0194US7780366B2Resist pattern forming methodTOKYO ELECTRON LTD·Filed 2007·Granted Aug 24, 2010·22 cites·32 claims
- 0293US7968825B2Temperature setting method of thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plateTOKYO ELECTRON LTD·Filed 2007·Granted Jun 28, 2011·29 cites·13 claims
- 0393US6313903B1Resist coating and developing unitTOKYO ELECTRON LTD·Filed 2000·Granted Nov 6, 2001·73 cites·18 claims
- 0493US5968691AMethod and apparatus for coating resist and developing the coated resistTOKYO ELECTRON LTD·Filed 1998·Granted Oct 19, 1999·93 cites·11 claims
- 0591US7488127B2Resist pattern forming apparatus and method thereofTOKYO ELECTRON LTD·Filed 2005·Granted Feb 10, 2009·16 cites·19 claims
- 0688US6266125B1Resist processing method and apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jul 24, 2001·57 cites·3 claims
- 0788US6051349AApparatus for coating resist and developing the coated resistTOKYO ELECTRON LTD·Filed 1999·Granted Apr 18, 2000·60 cites·13 claims
- 0888US5939130ACoating film forming method and coating film forming apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Aug 17, 1999·84 cites·23 claims
- 0984US6984477B2Resist pattern forming apparatus and method thereofTOKYO ELECTRON LTD·Filed 2001·Granted Jan 10, 2006·25 cites·12 claims
- 1084US6593045B2Substrate processing apparatus and methodTOKYO ELECTRON LTD·Filed 2001·Granted Jul 15, 2003·38 cites·53 claims
- 1183US6541170B2Resist processing method controlled through reflectivity dataTOKYO ELECTRON LTD·Filed 2001·Granted Apr 1, 2003·19 cites·8 claims
- 1283US6431769B1Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·26 cites·10 claims
- 1377US7957828B2Temperature setting method for thermal processing plate, temperature setting apparatus for thermal processing plate, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Jun 7, 2011·6 cites·23 claims
- 1477US6281962B1Processing apparatus for coating substrate with resist and developing exposed resist including inspection equipment for inspecting substrate and processing method thereofTOKYO ELECTRON LTD·Filed 1999·Granted Aug 28, 2001·52 cites·16 claims
- 1576US7968260B2Substrate processing method, computer-readable storage medium, and substrate processing systemTOKYO ELECTRON LTD·Filed 2009·Granted Jun 28, 2011·4 cites·9 claims
- 1676US6457882B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Oct 1, 2002·19 cites·39 claims
- 1773US6713120B2Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Mar 30, 2004·13 cites·10 claims
- 1873US6221787B1Apparatus and method of forming resist filmTOKYO ELECTRON LTD·Filed 1999·Granted Apr 24, 2001·43 cites·26 claims
- 1972US7867673B2Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such programTOKYO ELECTRON LTD·Filed 2006·Granted Jan 11, 2011·4 cites·14 claims
- 2072US5845170ADeveloping methodTOKYO ELECTRON LTD·Filed 1997·Granted Dec 1, 1998·43 cites·15 claims
- 2168US8253077B2Substrate processing method, computer-readable storage medium and substrate processing systemOGATA KUNIE·Filed 2011·Granted Aug 28, 2012·2 cites·5 claims
- 2268US8231285B2Substrate processing method and apparatusOGATA KUNIE·Filed 2009·Granted Jul 31, 2012·2 cites·34 claims
- 2368US7985516B2Substrate processing method, computer-readable storage medium and substrate processing systemTOKYO ELECTRON LTD·Filed 2009·Granted Jul 26, 2011·2 cites·6 claims
- 2467US7862966B2Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such programTOKYO ELECTRON LTD·Filed 2006·Granted Jan 4, 2011·2 cites·14 claims
- 2566US8041525B2Substrate measuring method, computer-readable recording medium recording program thereon, and substrate measuring systemTOKYO ELECTRON LTD·Filed 2007·Granted Oct 18, 2011·2 cites·7 claims
- 2666US7822574B2Substrate measuring method, computer-readable recording medium recording program thereon, and substrate processing systemTOKYO ELECTRON LTD·Filed 2007·Granted Oct 26, 2010·2 cites·3 claims
- 2764US7897896B2Temperature setting method of thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plateTOKYO ELECTRON LTD·Filed 2007·Granted Mar 1, 2011·2 cites·14 claims
- 2862US6990380B2Substrate processing apparatus and information storage apparatus and methodTOKYO ELECTRON LTD·Filed 2001·Granted Jan 24, 2006·8 cites·6 claims
- 2959US8135487B2Temperature setting method and apparatus for a thermal processing plateJYOUSAKA MEGUMI·Filed 2008·Granted Mar 13, 2012·2 cites·11 claims
- 3054US6394670B2Parts maintenance managing systemTOKYO ELECTRON LTD·Filed 2001·Granted May 28, 2002·4 cites·11 claims
- 3147US8308381B2Substrate processing method, computer-readable storage medium, and substrate processing systemTADOKORO MASAHIDE·Filed 2011·Granted Nov 13, 2012·0 cites·8 claims
- 3247US7884950B2Substrate processing method, program, computer-readable storage medium, and substrate processing systemTOKYO ELECTRON LTD·Filed 2007·Granted Feb 8, 2011·0 cites·10 claims
- 3345US7867674B2Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such programTOKYO ELECTRON LTD·Filed 2006·Granted Jan 11, 2011·0 cites·11 claims
- 3443US7031792B2Processing apparatus and information storage apparatus and methodTOKYO ELECTRON LTD·Filed 2002·Granted Apr 18, 2006·4 cites·4 claims
- 3538US8916229B2Substrate processing methodMIYATA AKIRA·Filed 2011·Granted Dec 23, 2014·0 cites·5 claims
- 3635US2002053321A1Coating film forming apparatus and coating film forming methodTOKYO ELECTRON LTD·Filed 2001·Application pending·0 cites
- 3734US2001016225A1Coating film forming apparatus and coating film forming methodFiled 2001·Application pending·0 cites
- 3833US8885140B2Substrate treatment apparatus, substrate treatment method and non-transitory storage mediumNAKASHIMA TOMOHIRO·Filed 2012·Granted Nov 11, 2014·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →