Inventor · disambiguated record
Lawrence D. Bartholomew
Also filed as: BARTHOLOMEW LAWRENCE D · BARTHOLOMEW LAWRENCE DUANE
8 granted patents·4 pending applications·462 citations·filing 1987–2017
90Inventor score
Files withSILICON VALLEY GROUP THERMAL3WATKINS JOHNSON CO3AVIZA TECH INC1BERCAW CRAIG1INTERMOLECULAR INC1
Top patents by PatentIndex Score
12 records- 0192US4834020AAtmospheric pressure chemical vapor deposition apparatusWATKINS JOHNSON CO·Filed 1987·Granted May 30, 1989·164 cites·5 claims
- 0291US5136975AInjector and method for delivering gaseous chemicals to a surfaceWATKINS JOHNSON CO·Filed 1990·Granted Aug 11, 1992·123 cites·15 claims
- 0389US6143080AWafer processing reactor having a gas flow control system and methodSILICON VALLEY GROUP THERMAL·Filed 2000·Granted Nov 7, 2000·70 cites·21 claims
- 0478US5849088AFree floating shieldWATKINS JOHNSON CO·Filed 1998·Granted Dec 15, 1998·46 cites·29 claims
- 0571US6761770B2Atmospheric pressure wafer processing reactor having an internal pressure control system and methodAVIZA TECH INC·Filed 2002·Granted Jul 13, 2004·18 cites·32 claims
- 0668US6352592B1Free floating shield and semiconductor processing systemSILICON VALLEY GROUP THERMAL·Filed 2000·Granted Mar 5, 2002·15 cites·24 claims
- 0762US6056824AFree floating shield and semiconductor processing systemSILICON VALLEY GROUP THERMAL·Filed 1998·Granted May 2, 2000·26 cites·42 claims
- 0849US10364497B2Vapor based site-isolated processing systems and methodsINTERMOLECULAR INC·Filed 2017·Granted Jul 30, 2019·0 cites·11 claims
- 0944US2007028838A1Gas manifold valve clusterBERCAW CRAIG·Filed 2006·Application pending·0 cites
- 1038US2002192377A1Gas distribution systemFiled 2002·Application pending·0 cites
- 1136US2001047756A1Gas distribution systemFiled 2000·Application pending·0 cites
- 1230US2004018735A1Method of depositing an oxide film by chemical vapor depositionFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →