Inventor · disambiguated record
Laurentius Cornelius De Winter
Also filed as: DE WINTER LAURENTIUS C · DE WINTER LAURENTIUS CORNELIUS
22 granted patents·2 pending applications·38 citations·filing 1998–2021
92Inventor score
Files withASML NETHERLANDS BV13DE WINTER LAURENTIUS CORNELIUS4BLEEKER ARNO JAN1COLINA SANTAMARIA LUIS ALBERTO1CORUS TECHNOLOGY BV1
Top patents by PatentIndex Score
24 records- 0190US7307690B1Device manufacturing method, computer program product and lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Dec 11, 2007·13 cites·20 claims
- 0287US10139725B2Lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted Nov 27, 2018·6 cites·24 claims
- 0379US9690210B2Lithographic apparatus and device manufacturing methodBLEEKER ARNO JAN·Filed 2012·Granted Jun 27, 2017·3 cites·19 claims
- 0476US7456931B2Device manufacturing method, computer program product and lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Nov 25, 2008·4 cites·23 claims
- 0572US11314174B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Apr 26, 2022·1 cites·12 claims
- 0667US10401723B2Patterning deviceASML NETHERLANDS BV·Filed 2017·Granted Sep 3, 2019·1 cites·13 claims
- 0767US7352443B2Radially polarized light in lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Apr 1, 2008·2 cites·33 claims
- 0865US8237913B2Lithographic apparatus and methodKAZINCZI ROBERT·Filed 2008·Granted Aug 7, 2012·3 cites·16 claims
- 0964US12346031B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2021·Granted Jul 1, 2025·0 cites·13 claims
- 1062US8134683B2Device manufacturing method, computer program and lithographic apparatusVAN DER LAAN HANS·Filed 2007·Granted Mar 13, 2012·2 cites·15 claims
- 1161US10732498B2Patterning deviceASML NETHERLANDS BV·Filed 2019·Granted Aug 4, 2020·0 cites·20 claims
- 1259US12271008B2Transmissive diffusorASML NETHERLANDS BV·Filed 2019·Granted Apr 8, 2025·0 cites·29 claims
- 1355US10331042B2Method for a lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Jun 25, 2019·0 cites·21 claims
- 1455US8178263B2Method for a lithographic apparatusDE WINTER LAURENTIUS CORNELIUS·Filed 2009·Granted May 15, 2012·0 cites·17 claims
- 1554US9535341B2Method for a lithographic apparatusDE WINTER LAURENTIUS CORNELIUS·Filed 2009·Granted Jan 3, 2017·0 cites·7 claims
- 1652US10928735B2Patterning deviceASML NETHERLANDS BV·Filed 2019·Granted Feb 23, 2021·0 cites·20 claims
- 1752US2008030708A1Device manufacturing methodASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 1851US8426088B2Method for a lithographic apparatusDE WINTER LAURENTIUS CORNELIUS·Filed 2012·Granted Apr 23, 2013·0 cites·20 claims
- 1942US9280064B2Lithographic method and apparatusENGBLOM PETER DAVID·Filed 2012·Granted Mar 8, 2016·0 cites·20 claims
- 2042US8717540B2Calculating a laser metric within a lithographic apparatus and method thereofKÖHLER CARSTEN ANDREAS·Filed 2011·Granted May 6, 2014·0 cites·19 claims
- 2141US2005007573A1Device manufacturing methodASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 2238US8300212B2Device manufacturing method and lithographic apparatusDE WINTER LAURENTIUS CORNELIUS·Filed 2010·Granted Oct 30, 2012·0 cites·18 claims
- 2335US8780325B2Method for a lithographic apparatusCOLINA SANTAMARIA LUIS ALBERTO·Filed 2009·Granted Jul 15, 2014·0 cites·22 claims
- 2423US6598442B1Production of a component for reducing the effects of an external mechanical impact, and the component produced in this wayCORUS TECHNOLOGY BV·Filed 1998·Granted Jul 29, 2003·3 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →