Inventor · disambiguated record
Larry D. Hartsough
Also filed as: HARTSOUGH LARRY D · HARTSOUGH LARRY DOWD
12 granted patents·2 pending applications·922 citations·filing 1977–2009
94Inventor score
Top patents by PatentIndex Score
14 records- 0197US6179973B1Apparatus and method for controlling plasma uniformity across a substrateNOVELLUS SYSTEMS INC·Filed 1999·Granted Jan 30, 2001·167 cites·20 claims
- 0296US6193854B1Apparatus and method for controlling erosion profile in hollow cathode magnetron sputter sourceNOVELLUS SYSTEMS INC·Filed 1999·Granted Feb 27, 2001·145 cites·34 claims
- 0394US4204936AMethod and apparatus for attaching a target to the cathode of a sputtering systemPERKIN ELMER CORP·Filed 1979·Granted May 27, 1980·41 cites·17 claims
- 0493US6500321B1Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering targetNOVELLUS SYSTEMS INC·Filed 2000·Granted Dec 31, 2002·47 cites·30 claims
- 0593US4260649ALaser induced dissociative chemical gas phase processing of workpiecesPERKIN ELMER CORP·Filed 1979·Granted Apr 7, 1981·164 cites·16 claims
- 0691US4420385AApparatus and process for sputter deposition of reacted thin filmsGRYPHON PRODUCTS·Filed 1983·Granted Dec 13, 1983·79 cites·12 claims
- 0789US6497796B1Apparatus and method for controlling plasma uniformity across a substrateNOVELLUS SYSTEMS INC·Filed 2000·Granted Dec 24, 2002·34 cites·15 claims
- 0887US4125446AControlled reflectance of sputtered aluminum layersAIRCO INC·Filed 1977·Granted Nov 14, 1978·47 cites·11 claims
- 0986US6444105B1Physical vapor deposition reactor including magnet to control flow of ionsNOVELLUS SYSTEMS INC·Filed 2000·Granted Sep 3, 2002·22 cites·23 claims
- 1085US5985115AInternally cooled target assembly for magnetron sputteringNOVELLUS SYSTEMS INC·Filed 1997·Granted Nov 16, 1999·55 cites·8 claims
- 1183US5503676AApparatus and method for magnetron in-situ cleaning of plasma reaction chamberLAM RES CORP·Filed 1995·Granted Apr 2, 1996·81 cites·24 claims
- 1281US5417833ASputtering apparatus having a rotating magnet array and fixed electromagnetsVARIAN ASSOCIATES·Filed 1993·Granted May 23, 1995·40 cites·16 claims
- 1352US2010018857A1Sputter cathode apparatus allowing thick magnetic targetsSEAGATE TECHNOLOGY LLC·Filed 2008·Application pending·0 cites
- 1451US2011199097A1Sensor system with reduced sensitivity to sample placementHARTSOUGH LARRY DOWD·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →