Inventor · disambiguated record
Lawrence S. Melvin, Iii
Also filed as: MELVIN III LAWRENCE S · MELVIN LAWRENCE S III
47 granted patents·2 pending applications·667 citations·filing 2003–2024
98Inventor score
Top patents by PatentIndex Score
49 records- 0199US7509621B2Method and apparatus for placing assist features by identifying locations of constructive and destructive interferenceSYNOPSYS INC·Filed 2005·Granted Mar 24, 2009·222 cites·15 claims
- 0297US7421678B2Assist feature placement using a process-sensitivity modelSYNOPSYS INC·Filed 2006·Granted Sep 2, 2008·200 cites·18 claims
- 0394US7739651B2Method and apparatus to determine if a pattern is robustly manufacturableSYNOPSYS INC·Filed 2007·Granted Jun 15, 2010·34 cites·9 claims
- 0493US7251807B2Method and apparatus for identifying a manufacturing problem area in a layout using a process-sensitivity modelSYNOPSYS INC·Filed 2005·Granted Jul 31, 2007·14 cites·12 claims
- 0592US11475201B2Inclusion of stochastic behavior in source mask optimizationSYNOPSYS INC·Filed 2021·Granted Oct 18, 2022·2 cites·20 claims
- 0692US7853919B2Modeling mask corner rounding effects using multiple mask layersSYNOPSYS INC·Filed 2010·Granted Dec 14, 2010·8 cites·21 claims
- 0792US7475382B2Method and apparatus for determining an improved assist feature configuration in a mask layoutSYNOPSYS INC·Filed 2005·Granted Jan 6, 2009·16 cites·12 claims
- 0891US7315999B2Method and apparatus for identifying assist feature placement problemsSYNOPSYS INC·Filed 2005·Granted Jan 1, 2008·14 cites·20 claims
- 0989US11556052B2Using mask fabrication models in correction of lithographic masksSYNOPSYS INC·Filed 2020·Granted Jan 17, 2023·2 cites·18 claims
- 1087US11468222B2Stochastic signal prediction in compact modelingSYNOPSYS INC·Filed 2021·Granted Oct 11, 2022·2 cites·20 claims
- 1187US7496880B2Method and apparatus for assessing the quality of a process modelSYNOPSYS INC·Filed 2005·Granted Feb 24, 2009·10 cites·9 claims
- 1285US7966582B2Method and apparatus for modeling long-range EUVL flareSYNOPSYS INC·Filed 2008·Granted Jun 21, 2011·9 cites·20 claims
- 1385US7934176B2Method and apparatus for determining a process model that models the impact of a CAR/PEB on the resist profileSYNOPSYS INC·Filed 2010·Granted Apr 26, 2011·4 cites·21 claims
- 1485US7721246B2Method and apparatus for quickly determining the effect of placing an assist feature at a location in a layoutSYNOPSYS INC·Filed 2006·Granted May 18, 2010·11 cites·18 claims
- 1584US7743357B2Method and apparatus for determining a process model that models the impact of CAR/PEB on the resist profileSYNOPSYS INC·Filed 2007·Granted Jun 22, 2010·6 cites·6 claims
- 1683US7454739B2Method and apparatus for determining an accurate photolithography process modelSYNOPSYS INC·Filed 2006·Granted Nov 18, 2008·7 cites·16 claims
- 1783US7243332B2Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity modelSYNOPSYS INC·Filed 2005·Granted Jul 10, 2007·10 cites·12 claims
- 1881US11093680B1Design-prioritized mask correctionSYNOPSYS INC·Filed 2019·Granted Aug 17, 2021·2 cites·25 claims
- 1981US7784018B2Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity modelSYNOPSYS INC·Filed 2007·Granted Aug 24, 2010·4 cites·4 claims
- 2081US7451068B2Method and apparatus for generating an OPC segmentation based on modeled intensity gradientsSYNOPSYS INC·Filed 2003·Granted Nov 11, 2008·19 cites·30 claims
- 2180US8181128B2Method and apparatus for determining a photolithography process model which models the influence of topography variationsHUANG JENSHENG·Filed 2008·Granted May 15, 2012·6 cites·15 claims
- 2279US9940694B2Resolution enhancement techniques based on holographic imaging technologySYNOPSYS INC·Filed 2015·Granted Apr 10, 2018·2 cites·17 claims
- 2379US8136054B2Compact abbe's kernel generation using principal component analysisCHEN CHARLIE CHUNG-PING·Filed 2009·Granted Mar 13, 2012·6 cites·20 claims
- 2479US7788630B2Method and apparatus for determining an optical model that models the effect of optical proximity correctionSYNOPSYS INC·Filed 2007·Granted Aug 31, 2010·5 cites·20 claims
- 2579US7707539B2Facilitating process model accuracy by modeling mask corner rounding effectsSYNOPSYS INC·Filed 2007·Granted Apr 27, 2010·4 cites·18 claims
- 2677US7320119B2Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity modelSYNOPSYS INC·Filed 2005·Granted Jan 15, 2008·3 cites·14 claims
- 2776US7494751B2Method and apparatus for improving depth of focus during optical lithographySYNOPSYS INC·Filed 2005·Granted Feb 24, 2009·4 cites·18 claims
- 2875US7934174B2Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layoutSYNOPSYS INC·Filed 2009·Granted Apr 26, 2011·7 cites·10 claims
- 2971US8473271B2Fast photolithography process simulation to predict remaining resist thicknessISOYAN ARTAK·Filed 2010·Granted Jun 25, 2013·2 cites·18 claims
- 3068US10365557B2Compact OPC model generation using virtual dataSYNOPSYS INC·Filed 2014·Granted Jul 30, 2019·1 cites·19 claims
- 3168US7509624B2Method and apparatus for modifying a layout to improve manufacturing robustnessSYNOPSYS INC·Filed 2006·Granted Mar 24, 2009·3 cites·16 claims
- 3266US7260812B2Method and apparatus for expediting convergence in model-based OPCSYNOPSYS INC·Filed 2004·Granted Aug 21, 2007·13 cites·24 claims
- 3366US2025076640A1Optical and manufacturing aware design flow for metasurfacesSYNOPSYS INC·Filed 2024·Application pending·0 cites
- 3463US7933471B2Method and system for correlating physical model representation to pattern layoutSYNOPSYS INC·Filed 2007·Granted Apr 26, 2011·3 cites·21 claims
- 3562US7491479B2Compensating for effects of topography variation by using a variable intensity-thresholdSYNOPSYS INC·Filed 2005·Granted Feb 17, 2009·2 cites·20 claims
- 3662US7308673B2Method and apparatus for correcting 3D mask effectsSYNOPSYS INC·Filed 2005·Granted Dec 11, 2007·1 cites·21 claims
- 3762US7251806B2Model-based two-dimensional interpretation filteringSYNOPSYS INC·Filed 2004·Granted Jul 31, 2007·6 cites·36 claims
- 3860US11741287B1Prioritized mask correctionSYNOPSYS INC·Filed 2021·Granted Aug 29, 2023·0 cites·20 claims
- 3960US11314171B2Lithography improvement based on defect probability distributions and critical dimension variationsSYNOPSYS INC·Filed 2020·Granted Apr 26, 2022·0 cites·20 claims
- 4060US7727687B2Method and apparatus for determining whether a sub-resolution assist feature will printSYNOPSYS INC·Filed 2006·Granted Jun 1, 2010·1 cites·12 claims
- 4159US7584450B2Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layoutSYNOPSYS INC·Filed 2006·Granted Sep 1, 2009·2 cites·14 claims
- 4257US11187973B2Reflective EUV mask absorber manipulation to improve wafer contrastSYNOPSYS INC·Filed 2019·Granted Nov 30, 2021·0 cites·15 claims
- 4356US2024288686A1Photolithography mask generation for metalensSYNOPSYS INC·Filed 2024·Application pending·0 cites
- 4453US11402742B1Undercut EUV absorber reflective contrast enhancementSYNOPSYS INC·Filed 2019·Granted Aug 2, 2022·0 cites·16 claims
- 4552US10915031B1Optical source compensationSYNOPSYS INC·Filed 2018·Granted Feb 9, 2021·0 cites·18 claims
- 4648US10852635B2Compact modeling for the negative tone development processesSYNOPSYS INC·Filed 2018·Granted Dec 1, 2020·0 cites·20 claims
- 4748US7973909B2Method and apparatus for using a synchrotron as a source in extreme ultraviolet lithographySYNOPSYS INC·Filed 2008·Granted Jul 5, 2011·0 cites·8 claims
- 4848US7739645B2Method and apparatus for determining a process model using a 2-D-pattern detecting kernelSYNOPSYS INC·Filed 2007·Granted Jun 15, 2010·0 cites·20 claims
- 4941US8184897B2Method and apparatus for determining an optical threshold and a resist biasLI JIANLIANG·Filed 2008·Granted May 22, 2012·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →