Inventor · disambiguated record
Laxman Murugesh
Also filed as: MURUGESH LAXMAN
23 granted patents·7 pending applications·3,293 citations·filing 1994–2024
97Inventor score
Top patents by PatentIndex Score
30 records- 0198US6217658B1Sequencing of the recipe steps for the optimal low-dielectric constant HDP-CVD ProcessingAPPLIED MATERIALS INC·Filed 1999·Granted Apr 17, 2001·886 cites·12 claims
- 0298US5937323ASequencing of the recipe steps for the optimal low-k HDP-CVD processingAPPLIED MATERIALS INC·Filed 1997·Granted Aug 10, 1999·935 cites·23 claims
- 0397US9993907B2Printed chemical mechanical polishing pad having printed windowAPPLIED MATERIALS INC·Filed 2014·Granted Jun 12, 2018·38 cites·12 claims
- 0497US6450117B1Directing a flow of gas in a substrate processing chamberAPPLIED MATERIALS INC·Filed 2000·Granted Sep 17, 2002·572 cites·61 claims
- 0597US6136685AHigh deposition rate recipe for low dielectric constant filmsAPPLIED MATERIALS INC·Filed 1997·Granted Oct 24, 2000·343 cites·14 claims
- 0694US7732056B2Corrosion-resistant aluminum component having multi-layer coatingAPPLIED MATERIALS INC·Filed 2005·Granted Jun 8, 2010·25 cites·24 claims
- 0793US5994662AUnique baffle to deflect remote plasma clean gasesAPPLIED MATERIALS INC·Filed 1997·Granted Nov 30, 1999·82 cites·20 claims
- 0890US8617672B2Localized surface annealing of components for substrate processing chambersBHATNAGAR ASHISH·Filed 2005·Granted Dec 31, 2013·23 cites·32 claims
- 0987US6200911B1Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma powerAPPLIED MATERIALS INC·Filed 1998·Granted Mar 13, 2001·57 cites·3 claims
- 1086US5811356AReduction in mobile ion and metal contamination by varying season time and bias RF power during chamber cleaningAPPLIED MATERIALS INC·Filed 1996·Granted Sep 22, 1998·48 cites·18 claims
- 1183US6579811B2Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heatingAPPLIED MATERIALS INC·Filed 2000·Granted Jun 17, 2003·19 cites·12 claims
- 1281US9481608B2Surface annealing of components for substrate processing chambersAPPLIED MATERIALS INC·Filed 2013·Granted Nov 1, 2016·4 cites·20 claims
- 1377US5997685ACorrosion-resistant apparatusAPPLIED MATERIALS INC·Filed 1996·Granted Dec 7, 1999·41 cites·46 claims
- 1477US5811195ACorrosion-resistant aluminum article for semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 1995·Granted Sep 22, 1998·49 cites·33 claims
- 1574US6375744B2Sequential in-situ heating and deposition of halogen-doped silicon oxideAPPLIED MATERIALS INC·Filed 2001·Granted Apr 23, 2002·17 cites·11 claims
- 1674US5756222ACorrosion-resistant aluminum article for semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 1994·Granted May 26, 1998·49 cites·29 claims
- 1772US2021245322A1Printing chemical mechanical polishing pad having window or controlled porosityAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1871US11007618B2Printing chemical mechanical polishing pad having window or controlled porosityAPPLIED MATERIALS INC·Filed 2018·Granted May 18, 2021·1 cites·12 claims
- 1970US7431772B2Gas distributor having directed gas flow and cleaning methodAPPLIED MATERIALS INC·Filed 2004·Granted Oct 7, 2008·11 cites·16 claims
- 2063US6228781B1Sequential in-situ heating and deposition of halogen-doped silicon oxideAPPLIED MATERIALS INC·Filed 1997·Granted May 8, 2001·25 cites·16 claims
- 2161US5810937AUsing ceramic wafer to protect susceptor during cleaning of a processing chamberAPPLIED MATERIALS INC·Filed 1996·Granted Sep 22, 1998·28 cites·15 claims
- 2259US6159333ASubstrate processing system configurable for deposition or cleaningAPPLIED MATERIALS INC·Filed 1998·Granted Dec 12, 2000·26 cites·13 claims
- 2357US6878214B2Process endpoint detection in processing chambersAPPLIED MATERIALS INC·Filed 2002·Granted Apr 12, 2005·9 cites·11 claims
- 2455US2025271215A1Oven with adjustable volume processing chamberYIELD ENG SYSTEMS INC·Filed 2024·Application pending·0 cites
- 2551US7135426B2Erosion resistant process chamber componentsAPPLIED MATERIALS INC·Filed 2004·Granted Nov 14, 2006·5 cites·13 claims
- 2646US2007108161A1Chamber components with polymer coatings and methods of manufactureAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 2742US2013035022A1Two-Part Plastic Retaining RingPAIK YOUNG J·Filed 2012·Application pending·0 cites
- 2841US2003157812A1Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using RF powerAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 2941US2005284372A1Chamber component having grooved surface with depressionsAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 3038US2004129210A1Gas nozzle for substrate processing chamberAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →