Inventor · disambiguated record
Lala Zhu
Also filed as: ZHU LALA
8 granted patents·6 pending applications·125 citations·filing 2016–2025
83Inventor score
Technology areasH10P
Files withAPPLIED MATERIALS INC14
Top patents by PatentIndex Score
14 records- 0198US9721789B1Saving ion-damaged spacersAPPLIED MATERIALS INC·Filed 2016·Granted Aug 1, 2017·117 cites·18 claims
- 0289US11915950B2Multi-zone semiconductor substrate supportsAPPLIED MATERIALS INC·Filed 2022·Granted Feb 27, 2024·1 cites·20 claims
- 0383US11276559B2Semiconductor processing chamber for multiple precursor flowAPPLIED MATERIALS INC·Filed 2017·Granted Mar 15, 2022·3 cites·18 claims
- 0479US2025239445A1Method and apparatus for selective deposition of dielectric filmsAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0574US11361939B2Semiconductor processing chamber for multiple precursor flowAPPLIED MATERIALS INC·Filed 2019·Granted Jun 14, 2022·1 cites·15 claims
- 0673US11101136B2Process window widening using coated parts in plasma etch processesAPPLIED MATERIALS INC·Filed 2019·Granted Aug 24, 2021·1 cites·20 claims
- 0772US11276590B2Multi-zone semiconductor substrate supportsAPPLIED MATERIALS INC·Filed 2017·Granted Mar 15, 2022·1 cites·20 claims
- 0872US10297458B2Process window widening using coated parts in plasma etch processesAPPLIED MATERIALS INC·Filed 2017·Granted May 21, 2019·1 cites·20 claims
- 0964US2021043448A1Method and Apparatus for Selective Deposition of Dielectric FilmsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1061US2025331267A1Self-limited etching of low-k materialsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1157US12315736B2Methods of highly selective silicon oxide removalAPPLIED MATERIALS INC·Filed 2022·Granted May 27, 2025·0 cites·20 claims
- 1257US2025125154A1Oxide quality differentiationAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1354US2018211833A1Method And Apparatus For Selective Deposition Of Dielectric FilmsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 1444US2022084845A1High conductance process kitAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →