Inventor · disambiguated record
Leonard Wai Fung Kho
Also filed as: KHO LEONARD · KHO LEONARD W · KHO LEONARD W F · KHO LEONARD WAI FUNG
34 granted patents·28 pending applications·480 citations·filing 2002–2023
97Inventor score
Top patents by PatentIndex Score
62 records- 0198US7292313B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2006·Granted Nov 6, 2007·141 cites·47 claims
- 0297US8934080B2Apparatus and methods for recovering fluid in immersion lithographyPOON ALEX KA TIM·Filed 2012·Granted Jan 13, 2015·33 cites·21 claims
- 0397US8743343B2Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2013·Granted Jun 3, 2014·31 cites·34 claims
- 0496US11365479B2Ex situ coating of chamber components for semiconductor processingLAM RES CORP·Filed 2020·Granted Jun 21, 2022·8 cites·16 claims
- 0596US8289497B2Apparatus and methods for recovering fluid in immersion lithographyPOON ALEX KA TIM·Filed 2009·Granted Oct 16, 2012·35 cites·36 claims
- 0695US8610873B2Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substratePOON ALEX KA TIM·Filed 2009·Granted Dec 17, 2013·26 cites·34 claims
- 0795US8237911B2Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machinePOON ALEX·Filed 2007·Granted Aug 7, 2012·34 cites·34 claims
- 0894US12227837B2Ex situ coating of chamber components for semiconductor processingLAM RES CORP·Filed 2022·Granted Feb 18, 2025·2 cites·19 claims
- 0994US10760158B2Ex situ coating of chamber components for semiconductor processingLAM RES CORP·Filed 2018·Granted Sep 1, 2020·14 cites·23 claims
- 1094US8400610B2Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machinePOON ALEX·Filed 2012·Granted Mar 19, 2013·32 cites·16 claims
- 1194US7576833B2Gas curtain type immersion lithography tool using porous material for fluid removalNIKON CORP·Filed 2007·Granted Aug 18, 2009·21 cites·37 claims
- 1293US8068209B2Nozzle to help reduce the escape of immersion liquid from an immersion lithography toolPOON ALEX KA TIM·Filed 2008·Granted Nov 29, 2011·34 cites·8 claims
- 1392US7532309B2Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluidNIKON CORP·Filed 2006·Granted May 12, 2009·15 cites·22 claims
- 1490US9547243B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2014·Granted Jan 17, 2017·3 cites·31 claims
- 1585US8896807B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2013·Granted Nov 25, 2014·2 cites·18 claims
- 1685US8520187B2Apparatus and method for providing fluid for immersion lithographyPOON ALEX KA TIM·Filed 2009·Granted Aug 27, 2013·4 cites·18 claims
- 1783US6917412B2Modular stage with reaction force cancellationNIKON CORP·Filed 2003·Granted Jul 12, 2005·22 cites·45 claims
- 1880US9329492B2Apparatus and method to control vacuum at porous material using multiple porous materialsNIKON CORP·Filed 2013·Granted May 3, 2016·3 cites·16 claims
- 1979US12163219B2Ex situ coating of chamber components for semiconductor processingLAM RES CORP·Filed 2022·Granted Dec 10, 2024·0 cites·19 claims
- 2079US9176394B2Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrateNIKON CORP·Filed 2013·Granted Nov 3, 2015·3 cites·19 claims
- 2179US7929109B2Apparatus and method for recovering liquid droplets in immersion lithographyNIKON CORP·Filed 2006·Granted Apr 19, 2011·5 cites·32 claims
- 2279US7751026B2Apparatus and method for recovering fluid for immersion lithographyNIKON CORP·Filed 2006·Granted Jul 6, 2010·4 cites·44 claims
- 2375US8054448B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2005·Granted Nov 8, 2011·3 cites·56 claims
- 2472US8634055B2Apparatus and method to control vacuum at porous material using multiple porous materialsPOON ALEX KA TIM·Filed 2010·Granted Jan 21, 2014·2 cites·47 claims
- 2572US8477284B2Apparatus and method to control vacuum at porous material using multiple porous materialsPOON ALEX KA TIM·Filed 2009·Granted Jul 2, 2013·3 cites·42 claims
- 2669US10203610B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2017·Granted Feb 12, 2019·0 cites·33 claims
- 2769US2019137888A1Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2019·Application pending·0 cites
- 2866US9817319B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2016·Granted Nov 14, 2017·0 cites·38 claims
- 2962US9217933B2Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2014·Granted Dec 22, 2015·0 cites·96 claims
- 3059US12476143B2Backside reactive inhibition gasLAM RES CORP·Filed 2021·Granted Nov 18, 2025·0 cites·13 claims
- 3157US2007195303A1Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2007·Application pending·0 cites
- 3254US2010186942A1Reticle error reduction by coolingPHILLIPS ALTON H·Filed 2009·Application pending·0 cites
- 3354US2025014938A1Edge rings for improved edged uniformity in semiconductor processing operationsLAM RES CORP·Filed 2022·Application pending·0 cites
- 3453US9285683B2Apparatus and method for providing fluid for immersion lithographyPOON ALEX KA TIM·Filed 2011·Granted Mar 15, 2016·0 cites·16 claims
- 3553US8780323B2Apparatus and method for recovering liquid droplets in immersion lithographyPOON ALEX KA TIM·Filed 2011·Granted Jul 15, 2014·0 cites·23 claims
- 3653US2025154652A1Layer uniformity improvement of deposition-inhibition-deposition processesLAM RES CORP·Filed 2023·Application pending·0 cites
- 3751US2025179637A1Showerhead for substrate processing systemsLAM RES CORP·Filed 2023·Application pending·0 cites
- 3849US2025323086A1Improved pedestals for substrate processing systemsLAM RES CORP·Filed 2023·Application pending·0 cites
- 3948US2010231876A1Apparatus and method for recovering fluid for immersion lithographyNIKON CORP·Filed 2010·Application pending·0 cites
- 4047US2023130557A1Reactant gas pulse deliveryLAM RES CORP·Filed 2021·Application pending·0 cites
- 4147US2023122846A1Feature fill with nucleation inhibitionLAM RES CORP·Filed 2021·Application pending·0 cites
- 4246US2008225248A1Apparatus, systems and methods for removing liquid from workpiece during workpiece processingNIKON CORP·Filed 2008·Application pending·0 cites
- 4346US2008212050A1Apparatus and methods for removing immersion liquid from substrates using temperature gradientNIKON CORP·Filed 2008·Application pending·0 cites
- 4446US2008231823A1Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatusNIKON CORP·Filed 2008·Application pending·0 cites
- 4546US2008198348A1Apparatus and methods for minimizing force variation from immersion liquid in lithography systemsNIKON CORP·Filed 2008·Application pending·0 cites
- 4645US2008100812A1Immersion lithography system and method having a wafer chuck made of a porous materialNIKON CORP·Filed 2007·Application pending·0 cites
- 4745US2008043211A1Apparatus and methods for recovering fluid in immersion lithographyNIKON CORP·Filed 2007·Application pending·0 cites
- 4844US12394608B2Cleaning system for removing deposits from pump in an exhaust of a substrate processing systemLAM RES CORP·Filed 2019·Granted Aug 19, 2025·0 cites·17 claims
- 4944US2007292245A1Stage assembly with secure device holderNIKON CORP·Filed 2007·Application pending·0 cites
- 5044US2007131879A1Force provider with adjustable force characteristics for a stage assemblyNIKON CORP·Filed 2007·Application pending·0 cites
Showing the top 50 of 62 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →