Inventor · disambiguated record
Leon Paul Van Dijk
Also filed as: VAN DIJK LEON PAUL
13 granted patents·3 pending applications·16 citations·filing 2016–2023
86Inventor score
Files withASML NETHERLANDS BV16
Top patents by PatentIndex Score
16 records- 0193US10474045B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 12, 2019·6 cites·20 claims
- 0285US11300889B2Metrology apparatusASML NETHERLANDS BV·Filed 2019·Granted Apr 12, 2022·3 cites·20 claims
- 0378US11294294B2Alignment mark positioning in a lithographic processASML NETHERLANDS BV·Filed 2019·Granted Apr 5, 2022·2 cites·20 claims
- 0478US11226567B2Methods and apparatus for use in a device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jan 18, 2022·2 cites·20 claims
- 0577US12189308B2Method for adjusting a target feature in a model of a patterning process based on local electric fieldsASML NETHERLANDS BV·Filed 2023·Granted Jan 7, 2025·0 cites·20 claims
- 0676US10788761B2Determining an optimal operational parameter setting of a metrology systemASML NETHERLANDS BV·Filed 2017·Granted Sep 29, 2020·1 cites·20 claims
- 0772US10545410B2Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2017·Granted Jan 28, 2020·1 cites·20 claims
- 0869US11320750B2Determining an optimal operational parameter setting of a metrology systemASML NETHERLANDS BV·Filed 2020·Granted May 3, 2022·0 cites·20 claims
- 0963US12254392B2Apparatus and method for property joint interpolation and predictionASML NETHERLANDS BV·Filed 2019·Granted Mar 18, 2025·1 cites·20 claims
- 1062US11619884B2Method for adjusting a target feature in a model of a patterning process based on local electric fieldsASML NETHERLANDS BV·Filed 2019·Granted Apr 4, 2023·0 cites·20 claims
- 1154US2024369943A1Methods and computer programs for data mapping for low dimensional data analysisASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1252US11126093B2Focus and overlay improvement by modifying a patterning deviceASML NETHERLANDS BV·Filed 2017·Granted Sep 21, 2021·0 cites·20 claims
- 1351US11300888B2Methods of determining stress in a substrate, control system for controlling a lithographic process, lithographic apparatus and computer program productASML NETHERLANDS BV·Filed 2018·Granted Apr 12, 2022·0 cites·20 claims
- 1442US11300887B2Method to change an etch parameterASML NETHERLANDS BV·Filed 2017·Granted Apr 12, 2022·0 cites·20 claims
- 1537US2019294059A1Method of determining pellicle compensation corrections for a lithographic process, metrology apparatus and computer programASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
- 1636US2019041758A1Methods of determining a mechanical property of a layer applied to a substrate, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →