Inventor · disambiguated record
Leiwu Zheng
Also filed as: ZHENG LEIWU
4 granted patents·5 pending applications·2 citations·filing 2017–2023
60Inventor score
Files withASML NETHERLANDS BV9
Top patents by PatentIndex Score
9 records- 0176US11675274B2Etch bias characterization and method of using the sameASML NETHERLANDS BV·Filed 2018·Granted Jun 13, 2023·1 cites·20 claims
- 0275US12468232B2Etch bias characterization and method of using the sameASML NETHERLANDS BV·Filed 2023·Granted Nov 11, 2025·0 cites·20 claims
- 0368US11614690B2Methods of tuning process modelsASML NETHERLANDS BV·Filed 2018·Granted Mar 28, 2023·1 cites·20 claims
- 0458US12505524B2Method for training or using a process model for determining a pattern in a patterning processASML NETHERLANDS BV·Filed 2020·Granted Dec 23, 2025·0 cites·21 claims
- 0555US2025021015A1Determining an etch effect based on an etch bias directionASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 0654US2024420025A1Generating augmented data to train machine learning models to preserve physical trendsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 0745US2022299881A1Methods for improving process based contour information of structure in imageASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 0844US2022284344A1Method for training machine learning model for improving patterning processASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 0937US2021294218A1Modeling post-exposure processesASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →