Inventor · disambiguated record

Linying Cui

Also filed as: CUI LINYING

23 granted patents·3 pending applications·92 citations·filing 2018–2023

94Inventor score

Technology areasH10P H01J

Files withAPPLIED MATERIALS INC26

Top patents by PatentIndex Score

26 records

0198US11776789B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2022·Granted Oct 3, 2023·6 cites·20 claims
0298US11462388B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·6 cites·20 claims
0398US11232933B2Temperature and bias control of edge ringAPPLIED MATERIALS INC·Filed 2020·Granted Jan 25, 2022·5 cites·20 claims
0497US12237148B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·2 cites·21 claims
0597US11948780B2Automatic electrostatic chuck bias compensation during plasma processingAPPLIED MATERIALS INC·Filed 2021·Granted Apr 2, 2024·7 cites·15 claims
0697US11462389B2Pulsed-voltage hardware assembly for use in a plasma processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·12 cites·17 claims
0796US12148595B2Plasma uniformity control in pulsed DC plasma chamberAPPLIED MATERIALS INC·Filed 2021·Granted Nov 19, 2024·4 cites·20 claims
0896US11901157B2Apparatus and methods for controlling ion energy distributionAPPLIED MATERIALS INC·Filed 2021·Granted Feb 13, 2024·5 cites·17 claims
0996US11791138B2Automatic electrostatic chuck bias compensation during plasma processingAPPLIED MATERIALS INC·Filed 2021·Granted Oct 17, 2023·4 cites·26 claims
1095US11798790B2Apparatus and methods for controlling ion energy distributionAPPLIED MATERIALS INC·Filed 2020·Granted Oct 24, 2023·3 cites·20 claims
1195US10763081B2Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process deviceAPPLIED MATERIALS INC·Filed 2018·Granted Sep 1, 2020·13 cites·17 claims
1294US11984306B2Plasma chamber and chamber component cleaning methodsAPPLIED MATERIALS INC·Filed 2021·Granted May 14, 2024·2 cites·20 claims
1394US11476145B2Automatic ESC bias compensation when using pulsed DC biasAPPLIED MATERIALS INC·Filed 2018·Granted Oct 18, 2022·10 cites·20 claims
1494US10784089B2Temperature and bias control of edge ringAPPLIED MATERIALS INC·Filed 2019·Granted Sep 22, 2020·7 cites·20 claims
1593US12183557B2Apparatus and methods for controlling ion energy distributionAPPLIED MATERIALS INC·Filed 2023·Granted Dec 31, 2024·1 cites·21 claims
1692US12255051B2Multi-shape voltage pulse trains for uniformity and etch profile tuningAPPLIED MATERIALS INC·Filed 2022·Granted Mar 18, 2025·3 cites·21 claims
1780US11289310B2Circuits for edge ring control in shaped DC pulsed plasma process deviceAPPLIED MATERIALS INC·Filed 2018·Granted Mar 29, 2022·2 cites·14 claims
1877US11908661B2Apparatus and methods for manipulating power at an edge ring in plasma process deviceAPPLIED MATERIALS INC·Filed 2022·Granted Feb 20, 2024·0 cites·13 claims
1974US11810768B2Temperature and bias control of edge ringAPPLIED MATERIALS INC·Filed 2021·Granted Nov 7, 2023·0 cites·12 claims
2071US11367593B2Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process deviceAPPLIED MATERIALS INC·Filed 2020·Granted Jun 21, 2022·0 cites·20 claims
2170US12394596B2Plasma uniformity control in pulsed DC plasma chamberAPPLIED MATERIALS INC·Filed 2021·Granted Aug 19, 2025·0 cites·23 claims
2266US12334311B2Circuits for edge ring control in shaped dc pulsed plasma process deviceAPPLIED MATERIALS INC·Filed 2022·Granted Jun 17, 2025·0 cites·16 claims
2359US2024355587A1Multi-electrode source assembly for plasma processingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
2459US2024355586A1Multi-electrode source assembly for plasma processingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
2552US2024194446A1Chamber impedance management in a processing chamberAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
2651US11276601B2Apparatus and methods for manipulating power at an edge ring in a plasma processing deviceAPPLIED MATERIALS INC·Filed 2020·Granted Mar 15, 2022·0 cites·14 claims

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →