Inventor · disambiguated record
Lifu Li
Also filed as: LI LIFU
7 granted patents·15 pending applications·0 citations·filing 2019–2025
68Inventor score
Files withTOKYO ELECTRON LTD22
Top patents by PatentIndex Score
22 records- 0174US12482638B2Substrate processing apparatus and shutterTOKYO ELECTRON LTD·Filed 2023·Granted Nov 25, 2025·0 cites·19 claims
- 0272US2025166975A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0368US2022157567A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 0464US2025349523A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0564US2025364212A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0663US12387914B2Upper electrode assemblyTOKYO ELECTRON LTD·Filed 2022·Granted Aug 12, 2025·0 cites·16 claims
- 0763US2025357174A1Substrate support and method of regenerating substrate supportTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0861US2025112031A1Substrate processing apparatus, substrate processing system, and cleaning methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0960US2024222090A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1056US12308221B2Substrate processing system and method for installing edge ringTOKYO ELECTRON LTD·Filed 2024·Granted May 20, 2025·0 cites·16 claims
- 1156US2025104979A1Substrate processing systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1253US12148598B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Nov 19, 2024·0 cites·11 claims
- 1352US11676800B2Substrate processing apparatus and control method of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jun 13, 2023·0 cites·8 claims
- 1450US2023207276A1Plasma processing apparatus and gas supply methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1549US12217942B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Feb 4, 2025·0 cites·6 claims
- 1649US2025226189A1Substrate treatment systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1748US2022301832A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1848US2025174434A1Plasma processing apparatus and power supply systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1948US2025183012A1Plasma processing apparatus and electrostatic chuckTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2046US11264248B2Etching method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Mar 1, 2022·0 cites·17 claims
- 2146US2021305022A1Edge ring, substrate support, plasma processing system and method of replacing edge ringTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2238US2020273712A1Deposition processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →