Inventor · disambiguated record
Liwan Yue
Also filed as: YUE LIWAN
9 granted patents·8 citations·filing 2015–2018
79Inventor score
Files withSEMICONDUCTOR MFG INT SHANGHAI CORP7SEMICONDUCTOR MFG INT SHANGHAI1SEMICONDUCTOR MFG INTERNATIONAL (SHANGHAI) CORPORATION1
Top patents by PatentIndex Score
9 records- 0188US9835956B2Apparatus and method for overlay measurementSEMICONDUCTOR MFG INTERNATIONAL (SHANGHAI) CORPORATION·Filed 2016·Granted Dec 5, 2017·4 cites·17 claims
- 0280US10042269B2Apparatus and method for overlay measurementSEMICONDUCTOR MFG INT SHANGHAI CORP·Filed 2016·Granted Aug 7, 2018·2 cites·19 claims
- 0377US9332626B1EUV light source and exposure apparatusSEMICONDUCTOR MFG INT SHANGHAI·Filed 2015·Granted May 3, 2016·2 cites·20 claims
- 0456US10187964B2Calibrating apparatus and methodSEMICONDUCTOR MFG INT SHANGHAI CORP·Filed 2018·Granted Jan 22, 2019·0 cites·14 claims
- 0555US10613307B2Integrated rotary structure and fabrication method thereofSEMICONDUCTOR MFG INT SHANGHAI CORP·Filed 2018·Granted Apr 7, 2020·0 cites·9 claims
- 0652US9927601B2Extreme ultraviolet light source, exposure apparatus, and integrated rotary structure fabricating methodSEMICONDUCTOR MFG INT SHANGHAI CORP·Filed 2016·Granted Mar 27, 2018·0 cites·17 claims
- 0750US9992857B2Light source and photolithography apparatus containing the same, calibrating apparatus and methodSEMICONDUCTOR MFG INT SHANGHAI CORP·Filed 2015·Granted Jun 5, 2018·0 cites·10 claims
- 0845US10553470B2Wafer alignment method and apparatus for overlay measurementSEMICONDUCTOR MFG INT SHANGHAI CORP·Filed 2017·Granted Feb 4, 2020·0 cites·22 claims
- 0941US9706632B2EUV light source and exposure apparatusSEMICONDUCTOR MFG INT SHANGHAI CORP·Filed 2015·Granted Jul 11, 2017·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →