Inventor · disambiguated record
Louis M. Kindt
Also filed as: KINDT LOUIS M
11 granted patents·4 pending applications·69 citations·filing 2002–2019
88Inventor score
Top patents by PatentIndex Score
15 records- 0179US7537114B2System and method for storing and transporting photomasks in fluidIBM·Filed 2006·Granted May 26, 2009·6 cites·31 claims
- 0278US7198276B2Adaptive electrostatic pin chuckIBM·Filed 2003·Granted Apr 3, 2007·25 cites·28 claims
- 0367US7049035B2Method for controlling linewidth in advanced lithography masks using electrochemistryIBM·Filed 2003·Granted May 23, 2006·11 cites·19 claims
- 0466US7355680B2Method for adjusting lithographic mask flatness using thermally induced pellicle stressIBM·Filed 2005·Granted Apr 8, 2008·2 cites·14 claims
- 0565US7826038B2Method for adjusting lithographic mask flatness using thermally induced pellicle stressIBM·Filed 2008·Granted Nov 2, 2010·2 cites·7 claims
- 0665US7198872B2Light scattering EUVL maskIBM·Filed 2004·Granted Apr 3, 2007·11 cites·48 claims
- 0760US11143953B2Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3IBM·Filed 2019·Granted Oct 12, 2021·0 cites·19 claims
- 0860US6777137B2EUVL mask structure and method of formationIBM·Filed 2002·Granted Aug 17, 2004·7 cites·20 claims
- 0958US7132206B2Process and apparatus for minimizing thermal gradients across an advanced lithographic maskIBM·Filed 2002·Granted Nov 7, 2006·5 cites·14 claims
- 1054US2008093342A1Etching apparatus for semicondutor fabricationDALTON TIMOTHY J·Filed 2007·Application pending·0 cites
- 1153US8758962B2Method and apparatus for sub-pellicle defect reduction on photomasksBURNHAM JAY S·Filed 2012·Granted Jun 24, 2014·0 cites·16 claims
- 1249US8173331B2Method and apparatus for sub-pellicle defect reduction on photomasksBURNHAM JAY S·Filed 2010·Granted May 8, 2012·0 cites·20 claims
- 1349US2006191638A1Etching apparatus for semiconductor fabricationIBM·Filed 2005·Application pending·0 cites
- 1434US2006199082A1Mask repairIBM·Filed 2005·Application pending·0 cites
- 1531US2004131947A1Reflective mask structure and method of formationIBM·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →