Inventor · disambiguated record
Luc Albarede
Also filed as: ALBAREDE LUC
19 granted patents·4 pending applications·134 citations·filing 2008–2022
93Inventor score
Top patents by PatentIndex Score
23 records- 0196US10134569B1Method and apparatus for real-time monitoring of plasma chamber wall conditionLAM RES CORP·Filed 2017·Granted Nov 20, 2018·22 cites·21 claims
- 0294US9401264B2Control of impedance of RF delivery pathLAM RES CORP·Filed 2013·Granted Jul 26, 2016·22 cites·28 claims
- 0394US9337000B2Control of impedance of RF return pathLAM RES CORP·Filed 2013·Granted May 10, 2016·32 cites·30 claims
- 0493US10249476B2Control of impedance of RF return pathLAM RES CORP·Filed 2016·Granted Apr 2, 2019·12 cites·20 claims
- 0589US10157730B2Control of impedance of RF delivery pathLAM RES CORP·Filed 2016·Granted Dec 18, 2018·6 cites·19 claims
- 0688US9735069B2Method and apparatus for determining process rateLAM RES CORP·Filed 2015·Granted Aug 15, 2017·5 cites·13 claims
- 0785US10903050B2Endpoint sensor based control including adjustment of an edge ring parameter for each substrate processed to maintain etch rate uniformityLAM RES CORP·Filed 2018·Granted Jan 26, 2021·4 cites·24 claims
- 0884US9119283B2Chamber matching for power control modeLAM RES CORP·Filed 2013·Granted Aug 25, 2015·10 cites·24 claims
- 0983US10302553B2Gas exhaust by-product measurement systemLAM RES CORP·Filed 2017·Granted May 28, 2019·4 cites·16 claims
- 1083US8473089B2Methods and apparatus for predictive preventive maintenance of processing chambersALBAREDE LUC·Filed 2010·Granted Jun 25, 2013·8 cites·18 claims
- 1179US9548189B2Plasma etching systems and methods using empirical mode decompositionLAM RES CORP·Filed 2015·Granted Jan 17, 2017·2 cites·11 claims
- 1270US9107284B2Chamber matching using voltage control modeLAM RES CORP·Filed 2013·Granted Aug 11, 2015·3 cites·23 claims
- 1365US8894804B2Plasma unconfinement sensor and methods thereofBOOTH JEAN-PAUL·Filed 2008·Granted Nov 25, 2014·1 cites·29 claims
- 1465US8618807B2Arrangement for identifying uncontrolled events at the process module level and methods thereofALBAREDE LUC·Filed 2010·Granted Dec 31, 2013·2 cites·10 claims
- 1561US8164353B2RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted Apr 24, 2012·1 cites·20 claims
- 1656US10504704B2Plasma etching systems and methods using empirical mode decompositionLAM RES CORP·Filed 2016·Granted Dec 10, 2019·0 cites·15 claims
- 1754US2021142991A1Apparatus with optical cavity for determining process rateLAM RES CORP·Filed 2021·Application pending·0 cites
- 1854US2024404804A1Reference Box for Direct-Drive Radiofrequency Power SupplyLAM RES CORP·Filed 2022·Application pending·0 cites
- 1951US11056322B2Method and apparatus for determining process rateLAM RES CORP·Filed 2017·Granted Jul 6, 2021·0 cites·9 claims
- 2051US2023230805A1Synchronization of rf pulsing schemes and of sensor data collectionLAM RES CORP·Filed 2021·Application pending·0 cites
- 2149US10930478B2Apparatus with optical cavity for determining process rateLAM RES CORP·Filed 2018·Granted Feb 23, 2021·0 cites·14 claims
- 2241US10784174B2Method and apparatus for determining etch process parametersLAM RES CORP·Filed 2017·Granted Sep 22, 2020·0 cites·14 claims
- 2333US2017084426A1Apparatus for determining process rateLAM RES CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →