Inventor · disambiguated record
Luoqi Chen
Also filed as: CHEN LUOQI
39 granted patents·4 pending applications·931 citations·filing 2004–2020
98Inventor score
Top patents by PatentIndex Score
43 records- 0198US11042687B2Fast freeform source and mask co-optimization methodASML NETHERLANDS BV·Filed 2020·Granted Jun 22, 2021·4 cites·20 claims
- 0298US9111062B2Fast freeform source and mask co-optimization methodASML NETHERLANDS BV·Filed 2013·Granted Aug 18, 2015·22 cites·16 claims
- 0398US7120895B2System and method for lithography simulationBRION TECH INC·Filed 2005·Granted Oct 10, 2006·73 cites·28 claims
- 0498US7117478B2System and method for lithography simulationBRION TECH INC·Filed 2005·Granted Oct 3, 2006·61 cites·52 claims
- 0598US7003758B2System and method for lithography simulationBRION TECH INC·Filed 2004·Granted Feb 21, 2006·281 cites·35 claims
- 0697US8589829B2Three-dimensional mask model for photolithography simulationLIU PENG·Filed 2013·Granted Nov 19, 2013·13 cites·28 claims
- 0797US8584056B2Fast freeform source and mask co-optimization methodCHEN LUOQI·Filed 2009·Granted Nov 12, 2013·42 cites·15 claims
- 0897US8065636B2System and method for creating a focus-exposure model of a lithography processYE JUN·Filed 2010·Granted Nov 22, 2011·18 cites·24 claims
- 0997US7747978B2System and method for creating a focus-exposure model of a lithography processASML NETHERLANDS BV·Filed 2006·Granted Jun 29, 2010·37 cites·43 claims
- 1097US7111277B2System and method for lithography simulationBRION TECH INC·Filed 2004·Granted Sep 19, 2006·65 cites·38 claims
- 1196US9372957B2Three-dimensional mask model for photolithography simulationASML NETHERLANDS BV·Filed 2015·Granted Jun 21, 2016·6 cites·11 claims
- 1296US8938694B2Three-dimensional mask model for photolithography simulationASML NETHERLANDS BV·Filed 2013·Granted Jan 20, 2015·22 cites·16 claims
- 1395US10839131B2Three-dimensional mask model for photolithography simulationASML NETHERLANDS BV·Filed 2019·Granted Nov 17, 2020·3 cites·21 claims
- 1495US9588438B2Optimization flows of source, mask and projection opticsHSU DUAN-FU·Filed 2011·Granted Mar 7, 2017·60 cites·22 claims
- 1595US8352885B2Three-dimensional mask model for photolithography simulationASML NETHERLANDS BV·Filed 2010·Granted Jan 8, 2013·21 cites·46 claims
- 1695US8245160B2System and method for creating a focus-exposure model of a lithography processYE JUN·Filed 2011·Granted Aug 14, 2012·11 cites·21 claims
- 1795US7114145B2System and method for lithography simulationBRION TECH INC·Filed 2004·Granted Sep 26, 2006·63 cites·54 claims
- 1894US8739082B2Method of pattern selection for source and mask optimizationLIU HUA-YU·Filed 2010·Granted May 27, 2014·11 cites·7 claims
- 1994US8543947B2Selection of optimum patterns in a design layout based on diffraction signature analysisLIU HUA-YU·Filed 2010·Granted Sep 24, 2013·15 cites·22 claims
- 2092US7117477B2System and method for lithography simulationBRION TECNOLOGIES INC·Filed 2004·Granted Oct 3, 2006·64 cites·55 claims
- 2191US8819601B2Integration of lithography apparatus and mask optimization process with multiple patterning processCHEN LUOQI·Filed 2012·Granted Aug 26, 2014·7 cites·20 claims
- 2288US11461532B2Three-dimensional mask model for photolithography simulationASML NETHERLANDS BV·Filed 2020·Granted Oct 4, 2022·1 cites·21 claims
- 2387US10198549B2Three-dimensional mask model for photolithography simulationASML NETHERLANDS BV·Filed 2016·Granted Feb 5, 2019·3 cites·28 claims
- 2487US9953127B2Fast freeform source and mask co-optimization methodASML NETHERLANDS BV·Filed 2015·Granted Apr 24, 2018·2 cites·23 claims
- 2587US7873937B2System and method for lithography simulationASML NETHERLANDS BV·Filed 2006·Granted Jan 18, 2011·9 cites·35 claims
- 2686US8893067B2System and method for lithography simulationASML NETHERLANDS BV·Filed 2013·Granted Nov 18, 2014·2 cites·18 claims
- 2784US9262579B2Integration of lithography apparatus and mask optimization process with multiple patterning processASML NETHERLANDS BV·Filed 2014·Granted Feb 16, 2016·3 cites·21 claims
- 2881US8209640B2System and method for lithography simulationYE JUN·Filed 2010·Granted Jun 26, 2012·3 cites·20 claims
- 2980US8682059B2Harmonic resist model for use in a lithographic apparatus and a device manufacturing methodCAO YU·Filed 2013·Granted Mar 25, 2014·2 cites·14 claims
- 3077US10592633B2Fast freeform source and mask co-optimization methodASML NETHERLANDS BV·Filed 2018·Granted Mar 17, 2020·1 cites·20 claims
- 3176US10401732B2Optimization flows of source, mask and projection opticsASML NETHERLANDS BV·Filed 2017·Granted Sep 3, 2019·1 cites·20 claims
- 3273US8447095B2Harmonic resist model for use in a lithographic apparatus and a device manufacturing methodCAO YU·Filed 2009·Granted May 21, 2013·2 cites·14 claims
- 3369US9110382B2Source polarization optimizationCHEN LUOQI·Filed 2011·Granted Aug 18, 2015·2 cites·20 claims
- 3467US8887104B2Correction for flare effects in lithography systemLIU HUA-YU·Filed 2011·Granted Nov 11, 2014·1 cites·16 claims
- 3561US8942463B2Harmonic resist model for use in a lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Jan 27, 2015·0 cites·26 claims
- 3658US8516405B2System and method for lithography simulationYE JUN·Filed 2012·Granted Aug 20, 2013·0 cites·17 claims
- 3757US10423745B2Correction for flare effects in lithography systemASML NETHERLANDS BV·Filed 2014·Granted Sep 24, 2019·0 cites·24 claims
- 3853US2014012672A1Content-based bidding in online advertisingYE JUN·Filed 2012·Application pending·0 cites
- 3953US2014012671A1Content-based targeted online advertisementYE JUN·Filed 2012·Application pending·0 cites
- 4051US2013066716A1Sentiment-targeting for online advertisementCHEN LUOQI·Filed 2011·Application pending·0 cites
- 4151US2013041750A1Method of attention-targeting for online advertisementFOUNTON TECHNOLOGIES LTD·Filed 2011·Application pending·0 cites
- 4244US10424395B2Computation pipeline of single-pass multiple variant callsSENTIEON INC·Filed 2016·Granted Sep 24, 2019·0 cites·20 claims
- 4343US10424396B2Computation pipeline of location-dependent variant callsSENTIEON INC·Filed 2016·Granted Sep 24, 2019·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →