Inventor · disambiguated record
Lucas Benjamin Henderson
Also filed as: HENDERSON LUCAS B · HENDERSON LUCAS BENJAMIN
2 granted patents·12 pending applications·0 citations·filing 2018–2025
23Inventor score
Top patents by PatentIndex Score
14 records- 0171US2022298664A1Composition for Cobalt Electroplating Comprising Leveling AgentBASF SE·Filed 2022·Application pending·0 cites
- 0268US2025382701A1Systems for on-site purification and related methodsENTEGRIS INC·Filed 2025·Application pending·0 cites
- 0366US11377748B2Composition for cobalt electroplating comprising leveling agentBASF SE·Filed 2018·Granted Jul 5, 2022·0 cites·12 claims
- 0463US2025075314A1Forming films with improved step coverageENTEGRIS INC·Filed 2024·Application pending·0 cites
- 0558US2025230543A1Systems for delivering precursors and related methodsENTEGRIS INC·Filed 2025·Application pending·0 cites
- 0657US2025079157A1Methods of improving metal oxide deposition with nitrogen oxide and related systemsENTEGRIS INC·Filed 2024·Application pending·0 cites
- 0755US2025051949A1Alkaline composition for copper electroplating comprising a grain refinerBASF SE·Filed 2022·Application pending·0 cites
- 0850US12098473B2Composition for cobalt plating comprising additive for void-free submicron feature fillingBASF SE·Filed 2019·Granted Sep 24, 2024·0 cites·19 claims
- 0950US2023203694A1Alkaline composition for copper electroplating comprising a grain refinerBASF SE·Filed 2021·Application pending·0 cites
- 1049US2021395513A1Epoxy resin compositionBASF SE·Filed 2019·Application pending·0 cites
- 1147US2025051950A1Alkaline composition for copper electroplating comprising a defect reduction agentBASF SE·Filed 2022·Application pending·0 cites
- 1243US2022324885A1Twin-monomer composition and dielectric film thereofBASF SE·Filed 2020·Application pending·0 cites
- 1343US2023203695A1Alkaline Composition For Copper Electroplating Comprising A Defect Reduction AgentBASF SE·Filed 2021·Application pending·0 cites
- 1441US2023265576A1Composition For Copper Electroplating On A Cobalt SeedBASF SE·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →