Inventor · disambiguated record
Masami Akimoto
Also filed as: AKIMOTO MASAMI
103 granted patents·6 pending applications·5,583 citations·filing 1989–2021
99Inventor score
Top patents by PatentIndex Score
109 records- 0198US6074154ASubstrate treatment system, substrate transfer system, and substrate transfer methodTOKYO ELECTRON LTD·Filed 1997·Granted Jun 13, 2000·457 cites·8 claims
- 0298US5826129ASubstrate processing systemTOKYO ELECTRON LTD·Filed 1995·Granted Oct 20, 1998·552 cites·23 claims
- 0397US11532492B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Dec 20, 2022·5 cites·15 claims
- 0497US5002008ACoating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by stateTOKYO ELECTRON LTD·Filed 1989·Granted Mar 26, 1991·115 cites·12 claims
- 0595US7797855B2Heating apparatus, and coating and developing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Sep 21, 2010·30 cites·8 claims
- 0695US7322756B2Coating and developing apparatus and coating and developing methodTOKYO ELECTRON LTD·Filed 2005·Granted Jan 29, 2008·33 cites·11 claims
- 0795US7241061B2Coating and developing system and coating and developing methodTOKYO ELECTRON LTD·Filed 2006·Granted Jul 10, 2007·34 cites·21 claims
- 0895US6627263B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2002·Granted Sep 30, 2003·95 cites·12 claims
- 0995US5061144AResist process apparatusTOKYO ELECTRON LTD·Filed 1989·Granted Oct 29, 1991·183 cites·10 claims
- 1095US4985722AApparatus for coating a photo-resist film and/or developing it after being exposedTOKYO ELECTRON LTD·Filed 1989·Granted Jan 15, 1991·144 cites·11 claims
- 1194US11208725B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 28, 2021·10 cites·17 claims
- 1294US7281869B2Coating and developing system and coating and developing methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 16, 2007·30 cites·34 claims
- 1394US7267497B2Coating and developing system and coating and developing methodTOKYO ELECTRON LTD·Filed 2005·Granted Sep 11, 2007·29 cites·13 claims
- 1493US6676757B2Coating film forming apparatus and coating unitTOKYO ELECTRON LTD·Filed 2000·Granted Jan 13, 2004·60 cites·12 claims
- 1593US6416583B1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 1999·Granted Jul 9, 2002·128 cites·22 claims
- 1693US6371667B1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Apr 16, 2002·76 cites·6 claims
- 1793US5442416AResist processing methodTOKYO ELECTRON LTD·Filed 1994·Granted Aug 15, 1995·138 cites·66 claims
- 1893US5361449ACleaning apparatus for cleaning reverse surface of semiconductor waferTOKYO ELECTRON LTD·Filed 1993·Granted Nov 8, 1994·165 cites·20 claims
- 1992US6425722B1Substrate treatment system, substrate transfer system, and substrate transfer methodTOKYO ELECTRON LTD·Filed 2000·Granted Jul 30, 2002·54 cites·6 claims
- 2092US6004047AMethod of and apparatus for processing photoresist, method of evaluating photoresist film, and processing apparatus using the evaluation methodTOKYO ELECTRON LTD·Filed 1998·Granted Dec 21, 1999·127 cites·22 claims
- 2192US5460478AMethod for processing wafer-shaped substratesTOKYO ELECTRON LTD·Filed 1995·Granted Oct 24, 1995·123 cites·14 claims
- 2292US5202716AResist process systemTOKYO ELECTRON LTD·Filed 1992·Granted Apr 13, 1993·146 cites·11 claims
- 2391US7245348B2Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaningTOKYO ELECTRON LTD·Filed 2005·Granted Jul 17, 2007·18 cites·27 claims
- 2491US6464789B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Oct 15, 2002·56 cites·20 claims
- 2591US5772764ACoating apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Jun 30, 1998·93 cites·14 claims
- 2691US5711646ASubstrate transfer apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Jan 27, 1998·128 cites·20 claims
- 2790US7998308B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Aug 16, 2011·16 cites·12 claims
- 2890US6383948B1Coating film forming apparatus and coating film forming methodTOKYO ELECTRON LTD·Filed 2000·Granted May 7, 2002·57 cites·19 claims
- 2990US5177514AApparatus for coating a photo-resist film and/or developing it after being exposedTOKYO ELECTRON LTD·Filed 1990·Granted Jan 5, 1993·75 cites·8 claims
- 3090US5089305ACoating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by stateTOKYO ELECTRON LTD·Filed 1990·Granted Feb 18, 1992·74 cites·6 claims
- 3189US7287920B2Semiconductor manufacturing apparatus and methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 30, 2007·15 cites·13 claims
- 3289US5364222AApparatus for processing wafer-shaped substratesTOKYO ELECTRON LTD·Filed 1993·Granted Nov 15, 1994·107 cites·21 claims
- 3388US6267516B1Developing apparatus and developing nozzleTOKYO ELECTRON LTD·Filed 2000·Granted Jul 31, 2001·35 cites·20 claims
- 3488US6097005ASubstrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 1999·Granted Aug 1, 2000·89 cites·26 claims
- 3587US6515731B1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Feb 4, 2003·40 cites·15 claims
- 3687US6190063B1Developing method and apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Feb 20, 2001·63 cites·16 claims
- 3787US5974682ACooling process systemTOKYO ELECTRON LTD·Filed 1997·Granted Nov 2, 1999·85 cites·14 claims
- 3887US5972110AResist processing systemTOKYO ELECTRON LTD·Filed 1997·Granted Oct 26, 1999·86 cites·19 claims
- 3987US5339128AResist processing methodTOKYO ELECTRON LTD·Filed 1993·Granted Aug 16, 1994·81 cites·30 claims
- 4086US5803932AResist processing apparatus having an interface section including two stacked substrate waiting tablesTOKYO ELECTRON LTD·Filed 1995·Granted Sep 8, 1998·84 cites·18 claims
- 4186US5651160ACleaning apparatus for cleaning substratesTOKYO ELECTRON LTD·Filed 1996·Granted Jul 29, 1997·73 cites·14 claims
- 4285US6616760B2Film forming unitTOKYO ELECTRON LTD·Filed 2000·Granted Sep 9, 2003·28 cites·14 claims
- 4384US5620560AMethod and apparatus for heat-treating substrateTOKYO ELECTRON LTD·Filed 1995·Granted Apr 15, 1997·70 cites·28 claims
- 4483US11637035B2Substrate processing apparatus with moving device for connecting and disconnecting heater electrodes and substrate processing method thereofTOKYO ELECTRON LTD·Filed 2019·Granted Apr 25, 2023·3 cites·19 claims
- 4583US6872256B2Film forming unitTOKYO ELECTRON LTD·Filed 2003·Granted Mar 29, 2005·25 cites·10 claims
- 4683US6514344B2Film forming unitTOKYO ELECTRON LTD·Filed 2000·Granted Feb 4, 2003·28 cites·39 claims
- 4783US5938847AMethod and apparatus for coating a film on an object being processedTOKYO ELECTRON LTD·Filed 1997·Granted Aug 17, 1999·58 cites·17 claims
- 4883US5312487ACoating apparatusTOKYO ELECTRON LTD·Filed 1992·Granted May 17, 1994·85 cites·22 claims
- 4983USD341418SSupply nozzle for applying liquid resist to a semiconductor waferTOKYO ELECTRON LTD·Filed 1991·Granted Nov 16, 1993·24 cites·1 claims
- 5082US7793610B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Sep 14, 2010·8 cites·20 claims
Showing the top 50 of 109 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →