Inventor · disambiguated record
Marcel Koenraad Marie Baggen
Also filed as: BAGGEN MARCEL K M · BAGGEN MARCEL KOENRAAD MARIE
18 granted patents·2 pending applications·149 citations·filing 2000–2021
92Inventor score
Top patents by PatentIndex Score
20 records- 0194US6542220B1Purge gas systems for use in lithographic projection apparatusASML NETHERLANDS BV·Filed 2000·Granted Apr 1, 2003·92 cites·15 claims
- 0289US11315752B2E-beam apparatusASML NETHERLANDS BV·Filed 2020·Granted Apr 26, 2022·2 cites·15 claims
- 0385US10191393B2Lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Jan 29, 2019·3 cites·22 claims
- 0485US7459701B2Stage apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Dec 2, 2008·12 cites·20 claims
- 0580US10867770B2E-beam apparatusASML NETHERLANDS BV·Filed 2019·Granted Dec 15, 2020·2 cites·20 claims
- 0679US7667822B2Lithographic apparatus and stage apparatusASML NETHERLANDS BV·Filed 2006·Granted Feb 23, 2010·6 cites·20 claims
- 0776US7884919B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Feb 8, 2011·4 cites·39 claims
- 0872US7675607B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 9, 2010·3 cites·23 claims
- 0970US6707530B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2002·Granted Mar 16, 2004·11 cites·10 claims
- 1068US8368868B2Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactlessASML NETHERLANDS BV·Filed 2009·Granted Feb 5, 2013·2 cites·14 claims
- 1165US7239370B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jul 3, 2007·8 cites·20 claims
- 1262US7830495B2Lithographic apparatus and position sensorASML NETHERLANDS BV·Filed 2007·Granted Nov 9, 2010·4 cites·9 claims
- 1352US11476077B2Interferometric stage positioning apparatusASML NETHERLANDS BV·Filed 2020·Granted Oct 18, 2022·0 cites·20 claims
- 1450US2008137049A1Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicleASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 1549US11302512B2Electron beam inspection apparatus stage positioningASML NETHERLANDS BV·Filed 2020·Granted Apr 12, 2022·0 cites·19 claims
- 1647US11621142B2Substrate positioning device and electron beam inspection toolASML NETHERLANDS BV·Filed 2020·Granted Apr 4, 2023·0 cites·14 claims
- 1747US2023152717A1Interface plate, inspection system and method of installing an inspection systemASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1843US10809634B2Stage system and metrology toolASML NETHERLANDS BV·Filed 2018·Granted Oct 20, 2020·0 cites·16 claims
- 1943US7733463B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Jun 8, 2010·0 cites·18 claims
- 2039US9097990B2Lithographic apparatus and stage systemVAN DER TOORN JAN-GERARD CORNELIS·Filed 2012·Granted Aug 4, 2015·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →