Inventor · disambiguated record
Manish Chandhok
Also filed as: CHANDHOK MANISH
86 granted patents·28 pending applications·249 citations·filing 2000–2025
99Inventor score
Top patents by PatentIndex Score
114 records- 0198US11444024B2Subtractively patterned interconnect structures for integrated circuitsINTEL CORP·Filed 2020·Granted Sep 13, 2022·10 cites·30 claims
- 0298US11239156B2Planar slab vias for integrated circuit interconnectsINTEL CORP·Filed 2020·Granted Feb 1, 2022·5 cites·15 claims
- 0396US11264449B2Capacitor architectures in semiconductor devicesINTEL CORP·Filed 2020·Granted Mar 1, 2022·5 cites·20 claims
- 0496US10892223B2Advanced lithography and self-assembled devicesINTEL CORP·Filed 2016·Granted Jan 12, 2021·11 cites·25 claims
- 0595US12218052B2Advanced lithography and self-assembled devicesINTEL CORP·Filed 2023·Granted Feb 4, 2025·1 cites·20 claims
- 0695US12027458B2Subtractively patterned interconnect structures for integrated circuitsINTEL CORP·Filed 2022·Granted Jul 2, 2024·2 cites·20 claims
- 0791US11854787B2Advanced lithography and self-assembled devicesINTEL CORP·Filed 2022·Granted Dec 26, 2023·1 cites·19 claims
- 0891US10937689B2Self-aligned hard masks with converted linersINTEL CORP·Filed 2016·Granted Mar 2, 2021·7 cites·20 claims
- 0991US9165824B2Interconnects with fully clad linesINTEL CORP·Filed 2013·Granted Oct 20, 2015·11 cites·19 claims
- 1090US10559529B2Pitch division patterning approaches with increased overlay margin for back end of line (BEOL) interconnect fabrication and structures resulting therefromINTEL CORP·Filed 2016·Granted Feb 11, 2020·6 cites·26 claims
- 1188US2025125260A1Advanced lithography and self-assembled devicesINTEL CORP·Filed 2024·Application pending·0 cites
- 1286US7459260B2Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the methodINTEL CORP·Filed 2005·Granted Dec 2, 2008·9 cites·27 claims
- 1386US7374867B2Enhancing photoresist performance using electric fieldsINTEL CORP·Filed 2003·Granted May 20, 2008·21 cites·10 claims
- 1485US11373950B2Advanced lithography and self-assembled devicesINTEL CORP·Filed 2020·Granted Jun 28, 2022·1 cites·19 claims
- 1585US8975138B2Method of creating a maskless air gap in back end interconnects with double self-aligned viasCHANDHOK MANISH·Filed 2013·Granted Mar 10, 2015·9 cites·14 claims
- 1684US10553532B2Structure and method to self align via to top and bottom of tight pitch metal interconnect layersINTEL CORP·Filed 2014·Granted Feb 4, 2020·6 cites·25 claims
- 1784US7078700B2Optics for extreme ultraviolet lithographyINTEL CORP·Filed 2004·Granted Jul 18, 2006·22 cites·23 claims
- 1883US12482744B2Subtractively patterned interconnect structures for integrated circuitsINTEL CORP·Filed 2024·Granted Nov 25, 2025·0 cites·19 claims
- 1983US10665499B2Integrated circuit with airgaps to control capacitanceINTEL CORP·Filed 2018·Granted May 26, 2020·4 cites·23 claims
- 2082US12342551B2Capacitor architectures in semiconductor devicesINTEL CORP·Filed 2024·Granted Jun 24, 2025·0 cites·20 claims
- 2182US11011463B2Dielectric helmet-based approaches for back end of line (BEOL) interconnect fabrication and structures resulting therefromINTEL CORP·Filed 2016·Granted May 18, 2021·3 cites·20 claims
- 2282US10256141B2Maskless air gap to prevent via punch throughINTEL CORP·Filed 2015·Granted Apr 9, 2019·3 cites·20 claims
- 2381US12506032B2Self-assembled guided hole and via patterning over gratingINTEL CORP·Filed 2024·Granted Dec 23, 2025·0 cites·20 claims
- 2481US7446873B2Reflective alignment gratingINTEL CORP·Filed 2005·Granted Nov 4, 2008·6 cites·12 claims
- 2580US6700649B2Method for improved resolution of patterning using binary masks with pupil filtersINTEL CORP·Filed 2002·Granted Mar 2, 2004·15 cites·3 claims
- 2679US11239112B2Passivating silicide-based approaches for conductive via fabrication and structures resulting therefromINTEL CORP·Filed 2017·Granted Feb 1, 2022·3 cites·25 claims
- 2779US10109583B2Method for creating alternate hardmask cap interconnect structure with increased overlay marginINTEL CORP·Filed 2014·Granted Oct 23, 2018·4 cites·25 claims
- 2876US2024038661A1Interconnects having a portion without a liner material and related structures, devices, and methodsINTEL CORP·Filed 2023·Application pending·0 cites
- 2975US7208747B2Adjustment of distance between source plasma and mirrors to change partial coherenceINTEL CORP·Filed 2006·Granted Apr 24, 2007·3 cites·11 claims
- 3074US11837542B2Interconnects having a portion without a liner material and related structures, devices, and methodsINTEL CORP·Filed 2022·Granted Dec 5, 2023·0 cites·25 claims
- 3174US11791375B2Capacitor architectures in semiconductor devicesINTEL CORP·Filed 2022·Granted Oct 17, 2023·0 cites·20 claims
- 3274US6567155B1Method for improved resolution of patterning using binary masks with pupil filtersINTEL CORP·Filed 2000·Granted May 20, 2003·11 cites·14 claims
- 3373US12080639B2Contact over active gate structures with metal oxide layers to inhibit shortingINTEL CORP·Filed 2019·Granted Sep 3, 2024·1 cites·17 claims
- 3473US11901404B2Capacitor architectures in semiconductor devicesINTEL CORP·Filed 2022·Granted Feb 13, 2024·0 cites·17 claims
- 3573US11862463B2Metal oxide nanoparticles as fillable hardmask materialsINTEL CORP·Filed 2021·Granted Jan 2, 2024·0 cites·8 claims
- 3672US12087836B2Contact over active gate structures with metal oxide-caped contacts to inhibit shortingINTEL CORP·Filed 2023·Granted Sep 10, 2024·0 cites·20 claims
- 3771US12230536B1Self-assembled guided hole and via patterning over gratingINTEL CORP·Filed 2021·Granted Feb 18, 2025·0 cites·20 claims
- 3871US7691544B2Measurement of a scattered light point spread function (PSF) for microelectronic photolithographyINTEL CORP·Filed 2006·Granted Apr 6, 2010·4 cites·19 claims
- 3971US6549272B1Method for improved resolution of patterning using binary masks with pupil filtersINTEL CORP·Filed 2000·Granted Apr 15, 2003·11 cites·10 claims
- 4070US12341092B2Planar slab vias for integrated circuit interconnectsINTEL CORP·Filed 2022·Granted Jun 24, 2025·0 cites·20 claims
- 4169US7527920B2Active hardmask for lithographic patterningINTEL CORP·Filed 2005·Granted May 5, 2009·2 cites·12 claims
- 4269US7098466B2Adjustable illumination sourceINTEL CORP·Filed 2004·Granted Aug 29, 2006·8 cites·20 claims
- 4369US2023307298A1Aligned pitch-quartered patterning for lithography edge placement error advanced rectificationINTEL CORP·Filed 2023·Application pending·0 cites
- 4468US11894270B2Grating replication using helmets and topographically-selective depositionINTEL CORP·Filed 2022·Granted Feb 6, 2024·0 cites·8 claims
- 4568US10546772B2Self-aligned via below subtractively patterned interconnectINTEL CORP·Filed 2016·Granted Jan 28, 2020·1 cites·20 claims
- 4666US12266527B1Directed self-assembly enabled patterning over metal layers using assisting featuresINTEL CORP·Filed 2021·Granted Apr 1, 2025·0 cites·20 claims
- 4766US12131991B2Self aligned gratings for tight pitch interconnects and methods of fabricationINTEL CORP·Filed 2022·Granted Oct 29, 2024·0 cites·20 claims
- 4866US11990403B2Dielectric helmet-based approaches for back end of line (BEOL) interconnect fabrication and structures resulting therefromINTEL CORP·Filed 2021·Granted May 21, 2024·0 cites·6 claims
- 4966US7033734B2Dipole illuminationINTEL CORP·Filed 2003·Granted Apr 25, 2006·8 cites·8 claims
- 5065US11887887B2Interconnect structures and methods of fabricationINTEL CORP·Filed 2022·Granted Jan 30, 2024·0 cites·18 claims
Showing the top 50 of 114 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →