Inventor · disambiguated record
Mahmoud Dahimene
Also filed as: DAHIMENE MAHMOUD
11 granted patents·3 pending applications·884 citations·filing 1986–2006
94Inventor score
Top patents by PatentIndex Score
14 records- 0197US7316761B2Apparatus for uniformly etching a dielectric layerAPPLIED MATERIALS INC·Filed 2003·Granted Jan 8, 2008·178 cites·20 claims
- 0296US6198616B1Method and apparatus for supplying a chucking voltage to an electrostatic chuck within a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1998·Granted Mar 6, 2001·271 cites·32 claims
- 0396US4727293APlasma generating apparatus using magnets and methodUNIV MICHIGAN STATE·Filed 1986·Granted Feb 23, 1988·94 cites·27 claims
- 0491US6638875B2Oxygen free plasma stripping processAXCELIS TECH INC·Filed 2001·Granted Oct 28, 2003·69 cites·6 claims
- 0590US6921727B2Method for modifying dielectric characteristics of dielectric layersAPPLIED MATERIALS INC·Filed 2003·Granted Jul 26, 2005·61 cites·35 claims
- 0687US5737177AApparatus and method for actively controlling the DC potential of a cathode pedestalAPPLIED MATERIALS INC·Filed 1996·Granted Apr 7, 1998·93 cites·13 claims
- 0784US6734120B1Method of photoresist ash residue removalAXCELIS TECH INC·Filed 2000·Granted May 11, 2004·34 cites·6 claims
- 0883US7374636B2Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactorAPPLIED MATERIALS INC·Filed 2002·Granted May 20, 2008·21 cites·16 claims
- 0977US6406836B1Method of stripping photoresist using re-coating materialAXCELIS TECH INC·Filed 2000·Granted Jun 18, 2002·21 cites·4 claims
- 1067US6005376ADC power supplyAPPLIED MATERIALS INC·Filed 1998·Granted Dec 21, 1999·22 cites·11 claims
- 1157US6273958B2Substrate support for plasma processingAPPLIED MATERIALS INC·Filed 1999·Granted Aug 14, 2001·20 cites·26 claims
- 1255US2006283553A1Plasma chamber insert ringAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1346US2003106646A1Plasma chamber insert ringAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 1437US2002101167A1Capacitively coupled reactive ion etch plasma reactor with overhead high density plasma source for chamber dry cleaningAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →