Inventor · disambiguated record
Martin Dauelsberg
Also filed as: DAUELSBERG MARTIN
10 granted patents·4 pending applications·509 citations·filing 2002–2015
89Inventor score
Top patents by PatentIndex Score
14 records- 0195US6849241B2Device and method for depositing one or more layers on a substrateAIXTRON AG·Filed 2002·Granted Feb 1, 2005·401 cites·20 claims
- 0289US7625448B2Inlet system for an MOCVD reactorAIXTRON AG·Filed 2006·Granted Dec 1, 2009·18 cites·20 claims
- 0387US9587312B2Gas inlet member of a CVD reactorSILVA HUGO·Filed 2012·Granted Mar 7, 2017·22 cites·13 claims
- 0485US8152924B2CVD reactor comprising a gas inlet memberDAUELSBERG MARTIN·Filed 2006·Granted Apr 10, 2012·13 cites·11 claims
- 0585US7294207B2Gas-admission element for CVD processes, and deviceAIXTRON AG·Filed 2003·Granted Nov 13, 2007·32 cites·9 claims
- 0677US6972050B2Method for depositing in particular crystalline layers, and device for carrying out the methodAIXTRON AG·Filed 2003·Granted Dec 6, 2005·17 cites·11 claims
- 0776US8157915B2CVD reactor having a process-chamber ceiling which can be loweredDAUELSBERG MARTIN·Filed 2007·Granted Apr 17, 2012·4 cites·13 claims
- 0870US10221482B2Gas distributor for a CVD reactorAIXTRON SE·Filed 2014·Granted Mar 5, 2019·1 cites·10 claims
- 0954US2010012036A1Isolation for multi-single-wafer processing apparatusSILVA HUGO·Filed 2009·Application pending·0 cites
- 1050US6932866B2Method for depositing in particular crystalline layersAIXTRON AG·Filed 2003·Granted Aug 23, 2005·1 cites·3 claims
- 1147US2008072821A1Small volume symmetric flow single wafer ald apparatusDALTON JEREMIC J·Filed 2007·Application pending·0 cites
- 1243US2012263877A1CVD Reactor Having Gas Inlet Zones that Run in a Strip-Like Manner and a Method for Deposition of a Layer on a Substrate in a CVD Reactor of this KindSTRAUCH GERHARD KARL·Filed 2010·Application pending·0 cites
- 1342US2012156396A1Cvd reactorSTRAUCH GERHARD KARL·Filed 2010·Application pending·0 cites
- 1436US10472718B2Temperature-controlled gas supply line with dilution gas flows supplied at multiple locationsAIXTRON SE·Filed 2015·Granted Nov 12, 2019·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →