Inventor · disambiguated record
Masahisa Endo
Also filed as: ENDO MASAHISA
18 granted patents·9 pending applications·88 citations·filing 1989–2023
91Inventor score
Files withNISSAN CHEMICAL CORP12SHINETSU HANDOTAI KK8THIN FILM ELECTRONICS ASA4NISSAN CHEMICAL IND LTD3
Top patents by PatentIndex Score
27 records- 0183US10590141B2Thioglycoluril compound, and method for producing sameNISSAN CHEMICAL CORP·Filed 2017·Granted Mar 17, 2020·2 cites·3 claims
- 0273US10202283B2Method for producing cyclic silane using concentration methodTHIN FILM ELECTRONICS ASA·Filed 2015·Granted Feb 12, 2019·1 cites·20 claims
- 0368US10723740B2Thioglycoluril compound, and method for producing sameNISSAN CHEMICAL CORP·Filed 2019·Granted Jul 28, 2020·0 cites·1 claims
- 0466US11104683B2Thioglycoluril compound, and method for producing sameNISSAN CHEMICAL CORP·Filed 2020·Granted Aug 31, 2021·0 cites·1 claims
- 0565US10683301B2Nitrogen-containing cyclic compounds and methods for producing the sameNISSAN CHEMICAL CORP·Filed 2017·Granted Jun 16, 2020·0 cites·4 claims
- 0665US5362683AMethod of making epitaxial wafersSHINETSU HANDOTAI KK·Filed 1994·Granted Nov 8, 1994·36 cites·8 claims
- 0764US4987472ACompound semiconductor epitaxial waferSHINETSU HANDOTAI KK·Filed 1989·Granted Jan 22, 1991·20 cites·2 claims
- 0859US6847056B2Light emitting deviceSHINETSU HANDOTAI KK·Filed 2002·Granted Jan 25, 2005·8 cites·15 claims
- 0953US10676463B2Monoglycidyl isocyanurate compound and production method thereforNISSAN CHEMICAL CORP·Filed 2017·Granted Jun 9, 2020·0 cites·6 claims
- 1053US2025362610A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 1149US2025085634A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1246US10450419B2High-molecular-weight polysilane and method for producing sameTHIN FILM ELECTRONICS ASA·Filed 2015·Granted Oct 22, 2019·0 cites·20 claims
- 1346US6781158B2Light emitting element and method for manufacturing thereofSHINETSU HANDOTAI KK·Filed 2002·Granted Aug 24, 2004·1 cites·18 claims
- 1445US2024201592A1Composition for forming resist underlayer filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1544US2024103369A1Resist underlayer film formation compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 1642US2019002727A1Ion complex material having function of inhibiting adhesion of biological substance and method for manufacturing the sameNISSAN CHEMICAL IND LTD·Filed 2016·Application pending·0 cites
- 1740US6048397AGaAsP epitaxial wafer and a method for manufacturing itSHINETSU HANDOTAI KK·Filed 1997·Granted Apr 11, 2000·9 cites·1 claims
- 1840US2020192224A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2018·Application pending·0 cites
- 1940US2020209745A1Photosensitive resin compositionNISSAN CHEMICAL CORP·Filed 2018·Application pending·0 cites
- 2037US11815815B2Composition for forming silicon-containing resist underlayer film removable by wet processNISSAN CHEMICAL IND LTD·Filed 2015·Granted Nov 14, 2023·0 cites·19 claims
- 2137US10845703B2Film-forming composition containing silicone having crosslinking reactivityNISSAN CHEMICAL IND LTD·Filed 2015·Granted Nov 24, 2020·0 cites·9 claims
- 2237US2020201183A1Resist underlayer film forming composition containing compound having hydantoin ringNISSAN CHEMICAL CORP·Filed 2017·Application pending·0 cites
- 2336US5366552AApparatus for liquid-phase epitaxial growthSHINETSU HANDOTAI KK·Filed 1992·Granted Nov 22, 1994·4 cites·7 claims
- 2436US2017313591A1Polymerization Inhibitor for SilaneTHIN FILM ELECTRONICS ASA·Filed 2015·Application pending·0 cites
- 2534US5759264AMethod for vapor-phase growthSHINETSU HANDOTAI KK·Filed 1996·Granted Jun 2, 1998·4 cites·3 claims
- 2632US5406093AGap pure green light emitting element substrateSHINETSU HANDOTAI KK·Filed 1994·Granted Apr 11, 1995·3 cites·3 claims
- 2731US10414661B2Method of producing silicon hydride oxide-containing solventTHIN FILM ELECTRONICS ASA·Filed 2015·Granted Sep 17, 2019·0 cites·16 claims
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