Inventor · disambiguated record
Martin Endres
Also filed as: ENDRES MARTIN
44 granted patents·11 pending applications·95 citations·filing 2007–2025
97Inventor score
Files withZEISS CARL SMT GMBH27ZEISS CARL SMT AG6ENDRES MARTIN4BAYERISCHE MOTOREN WERKE AG3OSSMANN JENS3
Top patents by PatentIndex Score
55 records- 0195US11169445B2Pupil facet mirror, optical system and illumination optics for a projection lithography systemZEISS CARL SMT GMBH·Filed 2020·Granted Nov 9, 2021·3 cites·21 claims
- 0292US8587767B2Illumination optics for EUV microlithography and related system and apparatusFIOLKA DAMIAN·Filed 2010·Granted Nov 19, 2013·12 cites·22 claims
- 0391US9983484B2Illumination optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted May 29, 2018·5 cites·20 claims
- 0489US9977335B2Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted May 22, 2018·4 cites·20 claims
- 0588US9874819B2Mirror arrayZEISS CARL SMT GMBH·Filed 2016·Granted Jan 23, 2018·4 cites·23 claims
- 0688US9411241B2Facet mirror for use in a projection exposure apparatus for microlithographyDINGER UDO·Filed 2010·Granted Aug 9, 2016·11 cites·27 claims
- 0787US9632422B2Illumination optical unitZEISS CARL SMT GMBH·Filed 2013·Granted Apr 25, 2017·5 cites·25 claims
- 0886US10018917B2Illumination optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted Jul 10, 2018·3 cites·19 claims
- 0985US8629972B2Projection objective for microlithographyZELLNER JOHANNES·Filed 2010·Granted Jan 14, 2014·6 cites·37 claims
- 1082US9996012B2Facet mirror for use in a projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Jun 12, 2018·2 cites·16 claims
- 1182US9678439B2MirrorZEISS CARL SMT GMBH·Filed 2015·Granted Jun 13, 2017·3 cites·23 claims
- 1279US8253925B2Catoptric illumination system for microlithography toolOSSMANN JENS·Filed 2009·Granted Aug 28, 2012·5 cites·24 claims
- 1377US8395754B2Illumination optical unit for EUV microlithographyENDRES MARTIN·Filed 2010·Granted Mar 12, 2013·4 cites·20 claims
- 1476US9310692B2Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatusSTUETZLE RALF·Filed 2010·Granted Apr 12, 2016·3 cites·35 claims
- 1575US9341958B2Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirrorZEISS CARL SMT GMBH·Filed 2013·Granted May 17, 2016·2 cites·20 claims
- 1674US9754695B2EUV collectorZEISS CARL SMT GMBH·Filed 2015·Granted Sep 5, 2017·2 cites·24 claims
- 1773US8174677B2Illumination optical system for microlithographyOSSMANN JENS·Filed 2008·Granted May 8, 2012·4 cites·20 claims
- 1872US2025216796A1Facet Mirror, Illumination Optical Unit, Arrangement of a Facet Mirror, Projection Exposure Apparatus and Method for Producing a Nanostructured ComponentZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1971US9897924B2Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2016·Granted Feb 20, 2018·1 cites·21 claims
- 2071US8937708B2Illumination optics for microlithographyENDRES MARTIN·Filed 2010·Granted Jan 20, 2015·2 cites·30 claims
- 2169US10067424B2Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Sep 4, 2018·1 cites·18 claims
- 2268US10146136B2Reflecting coating with optimized thicknessZEISS CARL SMT GMBH·Filed 2015·Granted Dec 4, 2018·1 cites·19 claims
- 2368US9063336B2Optical element having a plurality of reflective facet elementsKIRCH MARC·Filed 2012·Granted Jun 23, 2015·3 cites·29 claims
- 2468US8717541B2Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithographySTAICU ADRIAN·Filed 2011·Granted May 6, 2014·4 cites·28 claims
- 2566US9110378B2Illumination optical system for projection lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Aug 18, 2015·1 cites·24 claims
- 2665US9891530B2Illumination optical unitZEISS CARL SMT GMBH·Filed 2014·Granted Feb 13, 2018·1 cites·23 claims
- 2765US9164394B2Illumination optical system and optical systems for microlithographyENDRES MARTIN·Filed 2011·Granted Oct 20, 2015·1 cites·24 claims
- 2865US2025199422A1Individual mirror of a pupil facet mirror and pupil facet mirror for an illumination optical unit of a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 2962US2024011768A1Measuring device for interferometrically measuring a surface formZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 3060US7586113B2EUV illumination systemZEISS CARL SMT AG·Filed 2007·Granted Sep 8, 2009·2 cites·20 claims
- 3158US9304408B2Projection objective for microlithographyZEISS CARL SMT GMBH·Filed 2013·Granted Apr 5, 2016·0 cites·30 claims
- 3257US12473939B2Apparatus and method for connecting two components by means of at least one ballBAYERISCHE MOTOREN WERKE AG·Filed 2021·Granted Nov 18, 2025·0 cites·15 claims
- 3357US9671608B2Illumination system for EUV lithographyZEISS CARL SMT GMBH·Filed 2014·Granted Jun 6, 2017·0 cites·31 claims
- 3454US8227770B2EUV illumination systemENDRES MARTIN·Filed 2009·Granted Jul 24, 2012·0 cites·26 claims
- 3553US2009041182A1Illumination system for euv lithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3652US10877379B2Illumination intensity correction device for specifying an illumination intensity over an illumination field of a lithographic projection exposure apparatusASML NETHERLANDS BV·Filed 2020·Granted Dec 29, 2020·0 cites·20 claims
- 3752US9588434B2Catoptric illumination system for microlithography toolOSSMANN JENS·Filed 2012·Granted Mar 7, 2017·0 cites·25 claims
- 3852US9304406B2Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithographyZEISS CARL SMT GMBH·Filed 2014·Granted Apr 5, 2016·0 cites·20 claims
- 3950US11260483B2Apparatus for supporting at least one componentBAYERISCHE MOTOREN WERKE AG·Filed 2019·Granted Mar 1, 2022·0 cites·9 claims
- 4049US9897923B2Micromirror arrayZEISS CARL SMT GMBH·Filed 2016·Granted Feb 20, 2018·0 cites·20 claims
- 4149US9182578B2Imaging optical system and illumination optical systemMANN HANS-JUERGEN·Filed 2011·Granted Nov 10, 2015·0 cites·38 claims
- 4245US2008259303A1Projection exposure apparatus for microlithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4345US2008225387A1COLLECTOR FOR ILLUMINATION SYSTEMS WITH A WAVELENGTH LESS THAN OR EQUAL TO 193 nmZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4445US2009251677A1Illuminating optical unit and projection exposure apparatus for microlithographyZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 4544US2008278704A1ILLUMINATION SYSTEM FOR A PROJECTION EXPOSURE APPARATUS WITH WAVELENGTHS LESS THAN OR EQUAL TO 193 nmZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 4643US9304400B2Illumination system for EUV microlithographyLAYH MICHAEL·Filed 2011·Granted Apr 5, 2016·0 cites·34 claims
- 4742US9996010B2Illumination optical assembly for projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted Jun 12, 2018·0 cites·20 claims
- 4841US10133182B2Illumination optical assembly for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Nov 20, 2018·0 cites·18 claims
- 4941US2012274917A1Imaging opticsMANN HANS-JUERGEN·Filed 2012·Application pending·0 cites
- 5040US9915875B2Illumination optical assembly for projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted Mar 13, 2018·0 cites·20 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →