Inventor · disambiguated record
Matthew Flaugh
Also filed as: FLAUGH MATTHEW
4 granted patents·0 citations·filing 2020–2022
52Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD4
Top patents by PatentIndex Score
4 records- 0155US12512327B2Surface modification to achieve selective isotropic etchTOKYO ELECTRON LTD·Filed 2022·Granted Dec 30, 2025·0 cites·19 claims
- 0255US12272558B2Selective and isotropic etch of silicon over silicon-germanium alloys and dielectrics; via new chemistry and surface modificationTOKYO ELECTRON LTD·Filed 2022·Granted Apr 8, 2025·0 cites·20 claims
- 0351US11715643B2Gas phase etch with controllable etch selectivity of metalsTOKYO ELECTRON LTD·Filed 2020·Granted Aug 1, 2023·0 cites·16 claims
- 0451US11189499B2Atomic layer etch (ALE) of tungsten or other metal layersTOKYO ELECTRON LTD·Filed 2020·Granted Nov 30, 2021·0 cites·23 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →