Inventor · disambiguated record
Masato Hamada
Also filed as: HAMADA MASATO
13 granted patents·4 pending applications·100 citations·filing 1975–2022
88Inventor score
Top patents by PatentIndex Score
17 records- 0181US4126589AMethod for preparation of cation exchange membranesASAHI CHEMICAL IND·Filed 1977·Granted Nov 21, 1978·30 cites·4 claims
- 0276US4734474AFluorine-containing sulfonyl polymerASAHI CHEMICAL IND·Filed 1986·Granted Mar 29, 1988·29 cites·1 claims
- 0370US7107458B2Authentication communicating semiconductor deviceRENESAS TECH CORP·Filed 2001·Granted Sep 12, 2006·23 cites·11 claims
- 0456US4425199AProcess for the preparation of (ω-fluorosulfonyl)-haloaliphatic carboxylic acid fluoridesASAHI CHEMICAL IND·Filed 1982·Granted Jan 10, 1984·10 cites·6 claims
- 0554US11427921B2Electrolytic treatment apparatus and electrolytic treatment methodTOKYO ELECTRON LTD·Filed 2018·Granted Aug 30, 2022·0 cites·18 claims
- 0653US11427920B2Electrolytic processing jig and electrolytic processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Aug 30, 2022·0 cites·6 claims
- 0753US10903081B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Jan 26, 2021·0 cites·4 claims
- 0853US2023042744A1Plating method and plating apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 0952US2024318343A1Substrate liquid processing apparatus and substrate liquid processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1051US4466881AProcess for the preparation of (ω-fluorosulfonyl)haloaliphatic carboxylic acid fluoridesASAHI CHEMICAL IND·Filed 1983·Granted Aug 21, 1984·8 cites·4 claims
- 1149US10392719B2Electrolytic treatment apparatus and electrolytic treatment methodTOKYO ELECTRON LTD·Filed 2016·Granted Aug 27, 2019·0 cites·10 claims
- 1247US2017170021A1Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1341US10354915B2Adhesion layer forming method, adhesion layer forming system and recording mediumTOKYO ELECTRON LTD·Filed 2016·Granted Jul 16, 2019·0 cites·7 claims
- 1440US11111592B2Manufacturing apparatus and manufacturing method for semiconductor deviceTOKYO ELECTRON LTD·Filed 2016·Granted Sep 7, 2021·0 cites·13 claims
- 1537US11542627B2Electrolytic processing jig and electrolytic processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Jan 3, 2023·0 cites·13 claims
- 1635US2017167029A1Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1727US3981906AProcess for preparing alkyl 4,4'-(ethylenedioxy)bis-benzoatesASAHI CHEMICAL IND·Filed 1975·Granted Sep 21, 1976·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →