Inventor · disambiguated record
Masanobu Honda
Also filed as: HONDA MASANOBU
115 granted patents·45 pending applications·665 citations·filing 1983–2025
99Inventor score
Files withTOKYO ELECTRON LTD112HONDA MASANOBU22MATSUSHITA ELECTRONICS CORP10HITACHI LTD2KAWAMATA MASAYA2
Top patents by PatentIndex Score
160 records- 0198US9972503B2Etching methodTOKYO ELECTRON LTD·Filed 2017·Granted May 15, 2018·40 cites·16 claims
- 0298US9837285B2Etching methodTOKYO ELECTRON LTD·Filed 2015·Granted Dec 5, 2017·40 cites·11 claims
- 0398US8524331B2Substrate processing methodHONDA MASANOBU·Filed 2010·Granted Sep 3, 2013·35 cites·6 claims
- 0497US10090191B2Selective plasma etching method of a first region containing a silicon atom and an oxygen atomTOKYO ELECTRON LTD·Filed 2015·Granted Oct 2, 2018·39 cites·20 claims
- 0594US11101138B2Etching methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 24, 2021·3 cites·21 claims
- 0694US8128831B2Plasma etching method and computer-readable storage mediumSATO MANABU·Filed 2006·Granted Mar 6, 2012·50 cites·16 claims
- 0793US9460893B2Substrate processing apparatusKAWAMATA MASAYA·Filed 2012·Granted Oct 4, 2016·27 cites·9 claims
- 0893US8790489B2Substrate processing apparatus and substrate processing methodHONDA MASANOBU·Filed 2011·Granted Jul 29, 2014·17 cites·7 claims
- 0993US8642483B2Substrate processing with shrink etching stepHONDA MASANOBU·Filed 2010·Granted Feb 4, 2014·15 cites·26 claims
- 1093US7895970B2Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber componentTOKYO ELECTRON LTD·Filed 2006·Granted Mar 1, 2011·18 cites·12 claims
- 1192US11651971B2Etching method, substrate processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2021·Granted May 16, 2023·2 cites·21 claims
- 1291US9349619B2Plasma etching method and plasma etching apparatusKAWAMATA MASAYA·Filed 2012·Granted May 24, 2016·16 cites·5 claims
- 1388US7625494B2Plasma etching method and plasma etching unitTOKYO ELECTRON LTD·Filed 2004·Granted Dec 1, 2009·35 cites·14 claims
- 1487US7749914B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2004·Granted Jul 6, 2010·39 cites·6 claims
- 1587US4660110AMagnetic disk storage device with shroud enclosing disk assemblyHITACHI LTD·Filed 1983·Granted Apr 21, 1987·38 cites·6 claims
- 1686US8545671B2Plasma processing method and plasma processing apparatusHONDA MASANOBU·Filed 2011·Granted Oct 1, 2013·7 cites·6 claims
- 1786US7338576B2Plasma processing deviceTOKYO ELECTRON LTD·Filed 2002·Granted Mar 4, 2008·41 cites·12 claims
- 1885US8105949B2Substrate processing methodHONDA MASANOBU·Filed 2009·Granted Jan 31, 2012·10 cites·9 claims
- 1985US7883632B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Feb 8, 2011·8 cites·7 claims
- 2084US9607811B2Workpiece processing methodTOKYO ELECTRON LTD·Filed 2015·Granted Mar 28, 2017·4 cites·9 claims
- 2183US11488836B2Apparatus for substrate processingTOKYO ELECTRON LTD·Filed 2020·Granted Nov 1, 2022·1 cites·19 claims
- 2283US11355350B2Etching method, substrate processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Jun 7, 2022·1 cites·20 claims
- 2383US11328933B2Etching method, substrate processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted May 10, 2022·1 cites·14 claims
- 2483US4879618AWind breaking assembly for a magnetic headHITACHI LTD·Filed 1988·Granted Nov 7, 1989·34 cites·12 claims
- 2582US12112954B2Etching method, substrate processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2021·Granted Oct 8, 2024·1 cites·20 claims
- 2682US9390935B2Etching methodTOKYO ELECTRON LTD·Filed 2014·Granted Jul 12, 2016·5 cites·8 claims
- 2782US9330973B2Workpiece processing methodTOKYO ELECTRON LTD·Filed 2015·Granted May 3, 2016·4 cites·15 claims
- 2882US8440572B2Si etching methodHONDA MASANOBU·Filed 2009·Granted May 14, 2013·7 cites·10 claims
- 2981US8303834B2Plasma processing apparatus and plasma etching methodHONDA MASANOBU·Filed 2009·Granted Nov 6, 2012·6 cites·12 claims
- 3081US8104428B2Plasma processing apparatusHONDA MASANOBU·Filed 2007·Granted Jan 31, 2012·4 cites·2 claims
- 3180US12334343B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2024·Granted Jun 17, 2025·0 cites·18 claims
- 3280US10651044B2Processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted May 12, 2020·2 cites·9 claims
- 3380US10504745B2Method for processing target objectTOKYO ELECTRON LTD·Filed 2018·Granted Dec 10, 2019·2 cites·15 claims
- 3480US9299579B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Mar 29, 2016·3 cites·8 claims
- 3580US9202707B2Semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2013·Granted Dec 1, 2015·5 cites·8 claims
- 3679US9735027B2Method for etching organic filmTOKYO ELECTRON LTD·Filed 2016·Granted Aug 15, 2017·3 cites·5 claims
- 3779US9396962B2Etching methodTOKYO ELECTRON LTD·Filed 2015·Granted Jul 19, 2016·3 cites·3 claims
- 3879US8647442B2Cleaning substrate and cleaning methodYAMAZAWA YOHEI·Filed 2012·Granted Feb 11, 2014·2 cites·4 claims
- 3978US7794616B2Etching gas, etching method and etching gas evaluation methodTOKYO ELECTRON LTD·Filed 2005·Granted Sep 14, 2010·5 cites·10 claims
- 4077US8241514B2Plasma etching method and computer readable storage mediumHONDA MASANOBU·Filed 2009·Granted Aug 14, 2012·5 cites·20 claims
- 4176US11699614B2Film deposition method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jul 11, 2023·2 cites·13 claims
- 4276US10886136B2Method for processing substratesTOKYO ELECTRON LTD·Filed 2019·Granted Jan 5, 2021·1 cites·14 claims
- 4375US10586710B2Etching methodTOKYO ELECTRON LTD·Filed 2018·Granted Mar 10, 2020·1 cites·17 claims
- 4475US8173036B2Plasma processing method and apparatusHONDA MASANOBU·Filed 2006·Granted May 8, 2012·5 cites·12 claims
- 4573US8999068B2Chamber cleaning methodHONDA MASANOBU·Filed 2010·Granted Apr 7, 2015·3 cites·8 claims
- 4673US8057603B2Method of cleaning substrate processing chamber, storage medium, and substrate processing chamberHONDA MASANOBU·Filed 2007·Granted Nov 15, 2011·2 cites·2 claims
- 4772US8263499B2Plasma processing method and computer readable storage mediumHONDA MASANOBU·Filed 2009·Granted Sep 11, 2012·4 cites·21 claims
- 4872US2023035391A1Method for processing substratesTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 4971US9087676B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jul 21, 2015·2 cites·7 claims
- 5071US9048178B2Plasma etching method and semiconductor device manufacturing methodKUBOTA KAZUHIRO·Filed 2012·Granted Jun 2, 2015·3 cites·12 claims
Showing the top 50 of 160 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →