Inventor · disambiguated record
Masahiro Horigome
Also filed as: HORIGOME MASAHIRO
7 granted patents·10 pending applications·68 citations·filing 1988–2014
81Inventor score
Files withTOKYO ELECTRON LTD12SHINDENGEN ELECTRIC MFG2HORIGOME MASAHIRO1JAPAN ATOMIC ENERGY RES INST1UEDA HIROKAZU1
Top patents by PatentIndex Score
17 records- 0186US4839252AElectrophotographic photoreceptorSHINDENGEN ELECTRIC MFG·Filed 1988·Granted Jun 13, 1989·43 cites·3 claims
- 0274US9165771B2Pulsed gas plasma doping method and apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Oct 20, 2015·3 cites·20 claims
- 0358US4997738AElectrophotographic photoreceptor having silicate with perfluoroalkyl groups in protective layerSHINDENGEN ELECTRIC MFG·Filed 1989·Granted Mar 5, 1991·12 cites·8 claims
- 0453US4912000AElectrophotographic photoreceptorJAPAN ATOMIC ENERGY RES INST·Filed 1989·Granted Mar 27, 1990·10 cites·5 claims
- 0549US9472404B2Doping method, doping apparatus and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2014·Granted Oct 18, 2016·0 cites·14 claims
- 0646US9029249B2Plasma doping apparatus and plasma doping methodTOKYO ELECTRON LTD·Filed 2013·Granted May 12, 2015·0 cites·16 claims
- 0746US2010167507A1Plasma doping apparatus and plasma doping methodTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 0844US2010075066A1Plasma film forming apparatus and plasma film forming methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0943US2010090315A1Film forming method, film forming apparatus, storage medium and semiconductor deviceTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1043US2010244204A1Film forming method, film forming apparatus, storage medium and semiconductor deviceTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1142US2014094024A1Plasma doping apparatus, plasma doping method, and method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1242US2009134518A1Semiconductor device and manufacturing method of semiconductor deviceTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1341US2015132929A1Method for injecting dopant into substrate to be processed, and plasma doping apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1440US2014357068A1Plasma doping apparatus, plasma doping method, semiconductor device manufacturing method and semiconductor deviceTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 1538US2009085172A1Deposition Method, Deposition Apparatus, Computer Readable Medium, and Semiconductor DeviceTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1632US8765605B2Surface treatment for a fluorocarbon filmHORIGOME MASAHIRO·Filed 2010·Granted Jul 1, 2014·0 cites·40 claims
- 1730US2012190211A1Film forming method, semiconductor device manufacturing method, insulating film and semiconductor deviceUEDA HIROKAZU·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Masahiro Horigome files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →