Inventor · disambiguated record
Masamitsu Itoh
Also filed as: ITOH MASAMITSU
70 granted patents·8 pending applications·1,220 citations·filing 1977–2015
99Inventor score
Files withTOSHIBA KK43ITOH MASAMITSU16NAT TAX ADMINISTRATION AGENCY3FUKUHARA KAZUYA2INANAMI RYOICHI2
Top patents by PatentIndex Score
78 records- 0199US5188706AMethod of manufacturing an x-ray exposure mask and device for controlling the internal stress of thin filmsTOSHIBA KK·Filed 1990·Granted Feb 23, 1993·298 cites·17 claims
- 0297US5792376APlasma processing apparatus and plasma processing methodTOSHIBA KK·Filed 1995·Granted Aug 11, 1998·191 cites·8 claims
- 0396US6537844B1Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and serverTOSHIBA KK·Filed 2002·Granted Mar 25, 2003·51 cites·23 claims
- 0493US7673281B2Pattern evaluation method and evaluation apparatus and pattern evaluation programTOSHIBA KK·Filed 2007·Granted Mar 2, 2010·21 cites·13 claims
- 0593US6550990B2Substrate processing apparatus and processing method by use of the apparatusTOSHIBA KK·Filed 2001·Granted Apr 22, 2003·75 cites·23 claims
- 0692US7435609B2Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and serverTOSHIBA KK·Filed 2005·Granted Oct 14, 2008·9 cites·1 claims
- 0791US7313781B2Image data correction method, lithography simulation method, image data correction system, program, mask and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2005·Granted Dec 25, 2007·14 cites·18 claims
- 0888US7060519B2Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and serverTOSHIBA KK·Filed 2004·Granted Jun 13, 2006·17 cites·15 claims
- 0987US8025732B2Apparatus for processing a substrateTOSHIBA KK·Filed 2008·Granted Sep 27, 2011·10 cites·7 claims
- 1087US7390365B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2004·Granted Jun 24, 2008·27 cites·15 claims
- 1187US5166962AX-ray mask, method of manufacturing the same, and exposure method using the sameTOSHIBA KK·Filed 1992·Granted Nov 24, 1992·49 cites·15 claims
- 1286US6649310B2Method of manufacturing photomaskTOSHIBA KK·Filed 2001·Granted Nov 18, 2003·26 cites·60 claims
- 1385US6316163B1Pattern forming methodTOSHIBA KK·Filed 1998·Granted Nov 13, 2001·57 cites·29 claims
- 1484US8533634B2Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks productITOH MASAMITSU·Filed 2010·Granted Sep 10, 2013·3 cites·13 claims
- 1584US8502171B2Mask manufacturing deviceITOH MASAMITSU·Filed 2011·Granted Aug 6, 2013·4 cites·5 claims
- 1684US8407628B2Photomask manufacturing method and semiconductor device manufacturing methodITOH MASAMITSU·Filed 2010·Granted Mar 26, 2013·3 cites·10 claims
- 1784US6929903B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2003·Granted Aug 16, 2005·21 cites·10 claims
- 1883US8216744B2Exposure mask and method for manufacturing same and method for manufacturing semiconductor deviceITOH MASAMITSU·Filed 2010·Granted Jul 10, 2012·4 cites·16 claims
- 1982US8227267B2Template inspection method and manufacturing method for semiconductor deviceYONEDA IKUO·Filed 2009·Granted Jul 24, 2012·7 cites·8 claims
- 2082US8097539B2Imprint mask manufacturing method for nanoimprintingITOH MASAMITSU·Filed 2009·Granted Jan 17, 2012·5 cites·15 claims
- 2182US7479365B2Semiconductor device manufacturing methodTOSHIBA KK·Filed 2008·Granted Jan 20, 2009·6 cites·6 claims
- 2281US7904851B2Photomask manufacturing method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2007·Granted Mar 8, 2011·4 cites·10 claims
- 2380US5909030APattern transfer apparatus, an operation management system thereof, and an operation management system for a semiconductor manufacture apparatusTOSHIBA KK·Filed 1997·Granted Jun 1, 1999·45 cites·11 claims
- 2479US8407629B2Pattern verification-test method, optical image intensity distribution acquisition method, and computer programITOH MASAMITSU·Filed 2012·Granted Mar 26, 2013·2 cites·6 claims
- 2579US6172364B1Charged particle beam irradiation apparatusTOSHIBA KK·Filed 1998·Granted Jan 9, 2001·31 cites·15 claims
- 2679US5629115AExposure mask and method and apparatus for manufacturing the sameTOSHIBA KK·Filed 1996·Granted May 13, 1997·33 cites·60 claims
- 2778US9377682B2Template substrate, method for manufacturing same, and templateKANAMITSU SHINGO·Filed 2012·Granted Jun 28, 2016·5 cites·19 claims
- 2878US8193100B2Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks productITOH MASAMITSU·Filed 2009·Granted Jun 5, 2012·3 cites·13 claims
- 2978US8189903B2Photomask evaluation based on lithographic simulation using sidewall angle of photomask patternITOH MASAMITSU·Filed 2006·Granted May 29, 2012·4 cites·6 claims
- 3078US5907393AExposure mask and method and apparatus for manufacturing the sameTOSHIBA KK·Filed 1996·Granted May 25, 1999·32 cites·17 claims
- 3177US7906257B2Photomask manufacturing method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2008·Granted Mar 15, 2011·4 cites·20 claims
- 3277US7703066B2Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks productTOSHIBA KK·Filed 2005·Granted Apr 20, 2010·3 cites·11 claims
- 3377US7094522B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2004·Granted Aug 22, 2006·14 cites·4 claims
- 3476US8653483B2Mask manufacturing deviceTOSHIBA KK·Filed 2013·Granted Feb 18, 2014·2 cites·14 claims
- 3576US6727565B2Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and serverTOSHIBA KK·Filed 2003·Granted Apr 27, 2004·19 cites·7 claims
- 3674US5728494AExposure mask and method and apparatus for manufacturing the sameTOSHIBA KK·Filed 1996·Granted Mar 17, 1998·26 cites·4 claims
- 3773US8584054B2Photomask manufacturing method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2013·Granted Nov 12, 2013·2 cites·10 claims
- 3872US8219942B2Pattern verification-test method, optical image intensity distribution acquisition method, and computer programITOH MASAMITSU·Filed 2009·Granted Jul 10, 2012·2 cites·9 claims
- 3971US8274047B2Substrate surface inspection method and inspection apparatusNAITO YOSHIHIKO·Filed 2009·Granted Sep 25, 2012·4 cites·8 claims
- 4070US8658537B2Mask manufacturing method for nanoimprintingTOSHIBA KK·Filed 2013·Granted Feb 25, 2014·1 cites·19 claims
- 4170US7001086B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2004·Granted Feb 21, 2006·9 cites·10 claims
- 4269US9808841B2Reticle chuck cleaner and reticle chuck cleaning methodKOBAYASHI YOSHIHITO·Filed 2012·Granted Nov 7, 2017·1 cites·12 claims
- 4369US7629088B2Mask defect repairing method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2006·Granted Dec 8, 2009·2 cites·16 claims
- 4467US9412592B2Imprint mask, method for manufacturing the same, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2014·Granted Aug 9, 2016·1 cites·11 claims
- 4566US9034467B2Reticle chuck cleanerITOH MASAMITSU·Filed 2011·Granted May 19, 2015·2 cites·5 claims
- 4666US8758005B2Imprint mask, method for manufacturing the same, and method for manufacturing semiconductor deviceITOH MASAMITSU·Filed 2011·Granted Jun 24, 2014·1 cites·7 claims
- 4766US8121387B2Mask pattern verifying methodASANO MITSUYO·Filed 2008·Granted Feb 21, 2012·5 cites·15 claims
- 4866US7211354B2Mask substrate and its manufacturing methodDAINIPPON PRINTING CO LTD·Filed 2003·Granted May 1, 2007·9 cites·21 claims
- 4965US7351504B2Photomask blank substrate, photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2004·Granted Apr 1, 2008·8 cites·7 claims
- 5063US8465907B2Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and serverITOH MASAMITSU·Filed 2012·Granted Jun 18, 2013·0 cites·6 claims
Showing the top 50 of 78 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →