Inventor · disambiguated record
Margaret C. Lawson
Also filed as: LAWSON MARGARET C
15 granted patents·3 pending applications·201 citations·filing 1995–2014
93Inventor score
Top patents by PatentIndex Score
18 records- 0195US8759220B1Patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 24, 2014·13 cites·46 claims
- 0292US7335456B2Top coat material and use thereof in lithography processesIBM·Filed 2004·Granted Feb 26, 2008·37 cites·21 claims
- 0388US6818381B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2001·Granted Nov 16, 2004·21 cites·11 claims
- 0487US7563563B2Wet developable bottom antireflective coating composition and method for use thereofIBM·Filed 2006·Granted Jul 21, 2009·8 cites·1 claims
- 0584US7709187B2High resolution imaging process using an in-situ image modifying layerIBM·Filed 2006·Granted May 4, 2010·8 cites·23 claims
- 0683US6534239B2Resist compositions with polymers having pendant groups containing plural acid labile moietiesIBM·Filed 2001·Granted Mar 18, 2003·21 cites·23 claims
- 0781US5561194APhotoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyreneIBM·Filed 1995·Granted Oct 1, 1996·54 cites·19 claims
- 0877US6927015B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2004·Granted Aug 9, 2005·10 cites·5 claims
- 0971US7700262B2Top coat material and use thereof in lithography processesIBM·Filed 2008·Granted Apr 20, 2010·4 cites·20 claims
- 1071US6420101B1Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposureINFINEON TECHNOLOGIES AG·Filed 2000·Granted Jul 16, 2002·15 cites·4 claims
- 1170US6372408B1Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cyclesINFINEON TECHNOLOGIES AG·Filed 2000·Granted Apr 16, 2002·10 cites·4 claims
- 1255US8202678B2Wet developable bottom antireflective coating composition and method for use thereofCHEN KUANG-JUNG J·Filed 2009·Granted Jun 19, 2012·0 cites·21 claims
- 1355US2008038676A1Top coat material and use thereof in lithography processesIBM·Filed 2007·Application pending·0 cites
- 1450US7608390B2Top antireflective coating composition containing hydrophobic and acidic groupsIBM·Filed 2006·Granted Oct 27, 2009·0 cites·1 claims
- 1549US8304178B2Top antireflective coating composition containing hydrophobic and acidic groupsKHOJASTEH MAHMOUD·Filed 2009·Granted Nov 6, 2012·0 cites·12 claims
- 1647US9551696B2Cleanability assessment of sublimate from lithography materialsGLOBALFOUNDRIES INC·Filed 2014·Granted Jan 24, 2017·0 cites·20 claims
- 1739US2008248208A1Apparatus and method for measuring the quantity of condensable materials which outgas during cure of organic thin filmsCHACE MARK STEPHEN·Filed 2007·Application pending·0 cites
- 1833US2003003391A1High resolution photoresist compositionsSHIPLEY CO LLC·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →