Inventor · disambiguated record
Masahiko Matsudo
Also filed as: MATSUDO MASAHIKO
13 granted patents·572 citations·filing 1990–2003
93Inventor score
Top patents by PatentIndex Score
13 records- 0196US6659111B1Cleaning gas and method for cleaning vacuum treatment apparatus by flowing the cleaning gasCENTRAL GLASS CO LTD·Filed 2000·Granted Dec 9, 2003·312 cites·11 claims
- 0287US5532613AProbe needleTOKYO ELECTRON LTD·Filed 1994·Granted Jul 2, 1996·58 cites·26 claims
- 0384US5028791AElectron beam excitation ion sourceTOKYO ELECTRON LTD·Filed 1990·Granted Jul 2, 1991·44 cites·5 claims
- 0479US5101110AIon generatorTOKYO ELECTRON LTD·Filed 1990·Granted Mar 31, 1992·33 cites·19 claims
- 0577US5252892APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Oct 12, 1993·30 cites·12 claims
- 0674US5089710AIon implantation equipmentTOKYO ELECTRON LTD·Filed 1990·Granted Feb 18, 1992·32 cites·11 claims
- 0762US6057694ATesting method including the removal of insulative films for electrical contact and apparatus thereforTOKYO ELECTRON LTD·Filed 1997·Granted May 2, 2000·23 cites·16 claims
- 0862US5049784AElectron generating apparatusTOKYO ELECTRON LTD·Filed 1990·Granted Sep 17, 1991·16 cites·10 claims
- 0951US7615251B2Processing device using shower head structure and processing methodTOKYO ELECTRON LTD·Filed 2003·Granted Nov 10, 2009·3 cites·13 claims
- 1044US6448178B1Heat treating method for thin film and forming method for thin filmTOKYO ELECTRON LTD·Filed 2000·Granted Sep 10, 2002·2 cites·18 claims
- 1144US5698035AHeat-resistant electrode material, electrode using the same, and apparatus having plasma generating unit using this electrodeTOKYO ELECTRON LTD·Filed 1997·Granted Dec 16, 1997·12 cites·6 claims
- 1239US6821874B2Method for depositing tungsten silicide film and method for preparing gate electrode/wiringTOKYO ELECTRON LTD·Filed 2001·Granted Nov 23, 2004·0 cites·20 claims
- 1339US5690998AMethod of coating a conductive probe needleTOKYO ELECTRON LTD·Filed 1996·Granted Nov 25, 1997·7 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →