Inventor · disambiguated record
Masakazu Minami
Also filed as: MINAMI MASAKAZU
19 granted patents·6 pending applications·80 citations·filing 2005–2024
92Inventor score
Top patents by PatentIndex Score
25 records- 0195US10655220B2Gas control system, deposition apparatus including gas control system, and program and gas control method used for gas control systemHORIBA STEC CO LTD·Filed 2018·Granted May 19, 2020·7 cites·19 claims
- 0293US11631596B2Concentration control apparatus, source consumption quantity estimation method, and program recording medium on which a program for a concentration control apparatus is recordedHORIBA STEC CO LTD·Filed 2020·Granted Apr 18, 2023·3 cites·9 claims
- 0390US7604010B2Film formation apparatus and method of using the sameTOKYO ELECTRON LTD·Filed 2005·Granted Oct 20, 2009·13 cites·12 claims
- 0489US8800589B2Material gas concentration control systemMINAMI MASAKAZU·Filed 2009·Granted Aug 12, 2014·22 cites·11 claims
- 0587US10138555B2Gas control system and program for gas control systemHORIBA STEC CO LTD·Filed 2016·Granted Nov 27, 2018·3 cites·7 claims
- 0684US10927462B2Gas control system and film formation apparatus provided with gas control systemHORIBA STEC CO LTD·Filed 2017·Granted Feb 23, 2021·4 cites·12 claims
- 0784US8459291B2Source gas concentration control systemMINAMI MASAKAZU·Filed 2010·Granted Jun 11, 2013·9 cites·5 claims
- 0883US10718050B2Concentration control apparatus and material gas supply systemHORIBA STEC CO LTD·Filed 2018·Granted Jul 21, 2020·1 cites·19 claims
- 0980US9823181B2Cp2Mg concentration measuring deviceHORIBA STEC CO LTD·Filed 2016·Granted Nov 21, 2017·2 cites·6 claims
- 1079US8459290B2Material gas concentration control systemMINAMI MASAKAZU·Filed 2009·Granted Jun 11, 2013·15 cites·12 claims
- 1174US9970865B2Decomposition detecting unit, concentration measuring unit, and concentration control apparatusHORIBA STEC CO LTD·Filed 2015·Granted May 15, 2018·1 cites·9 claims
- 1271US12332175B2Optical measurement cell, optical analyzer, window forming member, and method of manufacturing optical measurement cellHORIBA STEC CO LTD·Filed 2022·Granted Jun 17, 2025·0 cites·6 claims
- 1367US12429420B2Gas analysis apparatus and gas analysis methodHORIBA STEC CO LTD·Filed 2023·Granted Sep 30, 2025·0 cites·8 claims
- 1462US2024094176A1Gas analysis device, fluid control system, gas analysis program, and gas analysis methodHORIBA STEC CO LTD·Filed 2023·Application pending·0 cites
- 1561US11796460B2Absorbance analysis apparatus for DCR gas, absorbance analysis method for DCR gas, and absorbance analysis program recording medium on which program for DCR gas is recordedTOKYO ELECTRON LTD·Filed 2022·Granted Oct 24, 2023·0 cites·5 claims
- 1658US12467856B2Gas analysis device and gas analysis methodHORIBA STEC CO LTD·Filed 2021·Granted Nov 11, 2025·0 cites·11 claims
- 1756US2025218827A1End point detection device, etching control system, end point detection method, and end point detection programHORIBA STEC CO LTD·Filed 2024·Application pending·0 cites
- 1854US11519070B2Vaporization device, film formation device, program for a concentration control mechanism, and concentration control methodHORIBA STEC CO LTD·Filed 2020·Granted Dec 6, 2022·0 cites·14 claims
- 1954US11493443B2Light absorbance analysis apparatus and program record medium for recording programs of light absorbance analysis apparatusHORIBA STEC CO LTD·Filed 2020·Granted Nov 8, 2022·0 cites·5 claims
- 2054US11226235B2Absorption spectroscopic system, program recording medium for an absorption spectroscopic system and absorbance measurement methodHORIBA STEC CO LTD·Filed 2020·Granted Jan 18, 2022·0 cites·7 claims
- 2153US2024030013A1Analysis device, analysis method, and analysis programHORIBA STEC CO LTD·Filed 2023·Application pending·0 cites
- 2248US11365480B2Concentration control apparatus, zero point adjustment method, and program recording medium recorded with concentration control apparatus programHORIBA STEC CO LTD·Filed 2020·Granted Jun 21, 2022·0 cites·13 claims
- 2343US2019333737A1Substrate processing apparatus and program for substrate processing apparatusHORIBA STEC CO LTD·Filed 2019·Application pending·0 cites
- 2438US2019242818A1Absorbance meter and semiconductor manufacturing device using absorbance meterHORIBA STEC CO LTD·Filed 2017·Application pending·0 cites
- 2529US2017138794A1Radiation thermometer, radiation temperature measurement system, storage medium having program for radiation thermometer stored therein, and radiation temperature measurement methodHORIBA LTD·Filed 2016·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Masakazu Minami files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →