Inventor · disambiguated record
Makoto Nakajima
Also filed as: NAKAJIMA MAKOTO
101 granted patents·46 pending applications·591 citations·filing 1976–2025
99Inventor score
Files withNISSAN CHEMICAL CORP52NISSAN CHEMICAL IND LTD25SUNTORY HOLDINGS LTD9NAKAJIMA MAKOTO7FUJIKOSHI MACHINERY CORP6
Top patents by PatentIndex Score
147 records- 0196US5441444APolishing machineFUJIKOSHI KIKAI KOGYO KK·Filed 1993·Granted Aug 15, 1995·146 cites·11 claims
- 0292US9863074B2Cord guide device and sewing machine provided with sameJANOME SEWING MACHINE CO LTD·Filed 2015·Granted Jan 9, 2018·6 cites·20 claims
- 0390US8048615B2Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coatingNISSAN CHEMICAL IND LTD·Filed 2006·Granted Nov 1, 2011·17 cites·10 claims
- 0489US10750764B2Stevia-containing beverageSUNTORY HOLDINGS LTD·Filed 2017·Granted Aug 25, 2020·1 cites·15 claims
- 0589US10645943B2Beverage containing tea polymerized polyphenol and RebD and/or RebMSUNTORY HOLDINGS LTD·Filed 2017·Granted May 12, 2020·1 cites·6 claims
- 0689US7427640B1Oil materials comprising dimerdiol ester and cosmetics comprising the esterNIPPON FINE CHEMICAL CO·Filed 2000·Granted Sep 23, 2008·33 cites·14 claims
- 0788US10645964B2Beverage containing catechin compound(s) and RebD and/or RebMSUNTORY HOLDINGS LTD·Filed 2017·Granted May 12, 2020·1 cites·10 claims
- 0887US9624611B2Sewing machineJANOME SEWING MACHINE CO LTD·Filed 2015·Granted Apr 18, 2017·4 cites·10 claims
- 0986US8426112B2Resist underlayer film forming composition containing polymer having nitrogen-containing silyl groupNAKAJIMA MAKOTO·Filed 2008·Granted Apr 23, 2013·9 cites·10 claims
- 1083US8828879B2Silicon-containing composition having sulfonamide group for forming resist underlayer filmKANNO YUTA·Filed 2010·Granted Sep 9, 2014·4 cites·12 claims
- 1182US9023588B2Resist underlayer film forming composition containing silicon having nitrogen-containing ringNAKAJIMA MAKOTO·Filed 2011·Granted May 5, 2015·8 cites·16 claims
- 1281US8835093B2Resist underlayer film forming composition containing silicon having anion groupSHIBAYAMA WATARU·Filed 2009·Granted Sep 16, 2014·7 cites·9 claims
- 1381US8815494B2Resist underlayer film forming composition containing silicon having anion groupNISSAN CHEMICAL IND LTD·Filed 2012·Granted Aug 26, 2014·4 cites·2 claims
- 1480US2025385444A1Cable connecting method, production method of connecting member, and thermal processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1579US9670608B2Sewing machineJANOME SEWING MACHINE CO LTD·Filed 2015·Granted Jun 6, 2017·2 cites·7 claims
- 1679US8864894B2Resist underlayer film forming composition containing silicone having onium groupSHIBAYAMA WATARU·Filed 2009·Granted Oct 21, 2014·5 cites·15 claims
- 1779US7842620B2Method for manufacturing semiconductor device using quadruple-layer laminateNISSAN CHEMICAL IND LTD·Filed 2007·Granted Nov 30, 2010·6 cites·10 claims
- 1879US6476847B2Pulse width modulation system and image forming apparatus having the pulse width modulation systemTOSHIBA TEC KK·Filed 2001·Granted Nov 5, 2002·24 cites·13 claims
- 1978US9760006B2Silicon-containing resist underlayer film forming composition having urea groupNAKAJIMA MAKOTO·Filed 2009·Granted Sep 12, 2017·5 cites·9 claims
- 2077US10197917B2Silicon-containing resists underlayer film-forming composition having phenyl group-containing chromophoreNISSAN CHEMICAL IND LTD·Filed 2015·Granted Feb 5, 2019·2 cites·10 claims
- 2176US10082735B2Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structureNISSAN CHEMICAL IND LTD·Filed 2015·Granted Sep 25, 2018·1 cites·11 claims
- 2276US7888301B2Resist, barc and gap fill material stripping chemical and methodADVANCED TECH MATERIALS·Filed 2004·Granted Feb 15, 2011·22 cites·32 claims
- 2376US5908347APolishing system for polishing waferFUJIKOSHI KIKAI KOGYO KK·Filed 1997·Granted Jun 1, 1999·50 cites·11 claims
- 2476US2025044697A1Composition for forming silicon-containing resist underlayer film having carbonyl structureNISSAN CHEMICAL CORP·Filed 2024·Application pending·0 cites
- 2575US11122824B2Stevia-containing beverageSUNTORY HOLDINGS LTD·Filed 2020·Granted Sep 21, 2021·0 cites·8 claims
- 2675US11022884B2Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl groupNISSAN CHEMICAL IND LTD·Filed 2015·Granted Jun 1, 2021·2 cites·18 claims
- 2775US10139729B2Coating composition for pattern reversal on soc patternNISSAN CHEMICAL IND LTD·Filed 2015·Granted Nov 27, 2018·2 cites·6 claims
- 2875US2024385521A1Primer for semiconductor substrate and method for forming a patternNISSAN CHEMICAL CORP·Filed 2024·Application pending·0 cites
- 2974US12248251B2Silicon-containing resist underlayer film-forming composition including organic group having ammonium groupNISSAN CHEMICAL CORP·Filed 2022·Granted Mar 11, 2025·0 cites·11 claims
- 3074US11284630B2Beverage containing tea polymerized polyphenol and RebD and/or RebMSUNTORY HOLDINGS LTD·Filed 2020·Granted Mar 29, 2022·0 cites·8 claims
- 3174US7432475B2Vertical heat treatment device and method controlling the sameTOKYO ELECTRON LTD·Filed 2004·Granted Oct 7, 2008·17 cites·12 claims
- 3273US11284638B2Beverage containing catechin compound(s) and RebD and/or RebMSUNTORY HOLDINGS LTD·Filed 2020·Granted Mar 29, 2022·0 cites·14 claims
- 3373US11215927B2Substrate treating composition and method for fabricating a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 4, 2022·0 cites·9 claims
- 3473US4354897AProcess for forming contact through holesFUJITSU LTD·Filed 1981·Granted Oct 19, 1982·36 cites·9 claims
- 3573US2023112897A1Composition for forming photocurable silicon-containing coating filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 3672US12332566B2Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2019·Granted Jun 17, 2025·0 cites·10 claims
- 3772US2025199409A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2025·Application pending·0 cites
- 3871US8877425B2Silicon-containing resist underlayer film forming composition having fluorine-based additiveKANNO YUTA·Filed 2011·Granted Nov 4, 2014·3 cites·20 claims
- 3970US10156033B2Sewing machineJANOME SEWING MACHINE CO LTD·Filed 2016·Granted Dec 18, 2018·1 cites·7 claims
- 4070US10080460B2Beverage extraction apparatusNAKAO YOSHIHIRO·Filed 2011·Granted Sep 25, 2018·2 cites·12 claims
- 4170US10000664B2Underlayer film-forming composition for self-assembled filmsNISSAN CHEMICAL IND LTD·Filed 2013·Granted Jun 19, 2018·2 cites·7 claims
- 4270US8121243B2In-core-monitor-guide-tube supporting apparatusYONEMOTO SATOSHI·Filed 2006·Granted Feb 21, 2012·3 cites·2 claims
- 4370US7029719B1Mayonnaise-like food and method of manufacturing the sameTAJIMAYA FOODS CO LTD·Filed 2000·Granted Apr 18, 2006·16 cites·16 claims
- 4470US4065426AMethod for the preparation of powdered rubberMITSUBISHI CHEM IND·Filed 1976·Granted Dec 27, 1977·22 cites·13 claims
- 4569US11561472B2Radiation sensitive compositionNISSAN CHEMICAL IND LTD·Filed 2016·Granted Jan 24, 2023·1 cites·11 claims
- 4669US10051989B2Beverage extraction apparatusNAKAO YOSHIHIRO·Filed 2011·Granted Aug 21, 2018·3 cites·15 claims
- 4769US7115026B2Polishing apparatusFUJIKOSHI MACHINERY CORP·Filed 2005·Granted Oct 3, 2006·3 cites·12 claims
- 4869US4976393ASemiconductor device and production process thereof, as well as wire bonding device used thereforHITACHI LTD·Filed 1987·Granted Dec 11, 1990·40 cites·33 claims
- 4969US2023125270A1Radiation sensitive compositionNISSAN CHEMICAL IND LTD·Filed 2022·Application pending·0 cites
- 5068US6705929B1Cloth cleaning device and polishing machineFUJIKOSHI MACHINERY CORP·Filed 2000·Granted Mar 16, 2004·14 cites·20 claims
Showing the top 50 of 147 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →