Inventor · disambiguated record
Mayuko Nakamura
Also filed as: NAKAMURA MAYUKO
3 granted patents·1 pending application·0 citations·filing 2019–2022
39Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD4
Top patents by PatentIndex Score
4 records- 0155US12347676B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2022·Granted Jul 1, 2025·0 cites·15 claims
- 0253US12482695B2Substrate treatment method and substrate treatment deviceTOKYO ELECTRON LTD·Filed 2021·Granted Nov 25, 2025·0 cites·12 claims
- 0346US11915964B2Substrate processing apparatus and stageTOKYO ELECTRON LTD·Filed 2020·Granted Feb 27, 2024·0 cites·10 claims
- 0438US2022005690A1Method of forming silicon film on substrate having fine patternTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →