Inventor · disambiguated record
Mamoru Nakasuji
Also filed as: NAKASUJI MAMORU
134 granted patents·11 pending applications·3,418 citations·filing 1978–2014
99Inventor score
Top patents by PatentIndex Score
145 records- 0199US7420164B2Objective lens, electron beam system and method of inspecting defectEBARA CORP·Filed 2005·Granted Sep 2, 2008·68 cites·1 claims
- 0299US7109483B2Method for inspecting substrate, substrate inspecting system and electron beam apparatusEBARA CORP·Filed 2001·Granted Sep 19, 2006·159 cites·9 claims
- 0398US9368314B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2014·Granted Jun 14, 2016·38 cites·10 claims
- 0498US7601972B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2007·Granted Oct 13, 2009·49 cites·8 claims
- 0598US6992290B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jan 31, 2006·97 cites·5 claims
- 0698US6593152B2Electron beam apparatus and method of manufacturing semiconductor device using the apparatusEBARA CORP·Filed 2001·Granted Jul 15, 2003·109 cites·60 claims
- 0798US5892224AApparatus and methods for inspecting wafers and masks using multiple charged-particle beamsNIKON CORP·Filed 1997·Granted Apr 6, 1999·285 cites·70 claims
- 0897US7351969B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2005·Granted Apr 1, 2008·37 cites·5 claims
- 0997US7297949B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2006·Granted Nov 20, 2007·28 cites·6 claims
- 1097US7244932B2Electron beam apparatus and device fabrication method using the electron beam apparatusEBARA CORP·Filed 2001·Granted Jul 17, 2007·74 cites·51 claims
- 1197US7223973B2Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using formerEBARA CORP·Filed 2005·Granted May 29, 2007·38 cites·10 claims
- 1297US7135676B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2001·Granted Nov 14, 2006·61 cites·12 claims
- 1397US6855929B2Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using formerEBARA CORP·Filed 2001·Granted Feb 15, 2005·106 cites·55 claims
- 1497US6465783B1High-throughput specimen-inspection apparatus and methods utilizing multiple parallel charged particle beams and an array of multiple secondary-electron-detectorsNIKON CORP·Filed 2000·Granted Oct 15, 2002·87 cites·35 claims
- 1596US7569838B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Aug 4, 2009·23 cites·5 claims
- 1696US7439502B2Electron beam apparatus and device production method using the electron beam apparatusEBARA CORP·Filed 2007·Granted Oct 21, 2008·23 cites·7 claims
- 1796US7417236B2Sheet beam-type testing apparatusEBARA CORP·Filed 2006·Granted Aug 26, 2008·20 cites·18 claims
- 1896US7385197B2Electron beam apparatus and a device manufacturing method using the same apparatusEBARA CORP·Filed 2005·Granted Jun 10, 2008·30 cites·5 claims
- 1996US7049585B2Sheet beam-type testing apparatusEBARA CORP·Filed 2001·Granted May 23, 2006·55 cites·7 claims
- 2095US8822919B2Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using formerKIMBA TOSHIFUMI·Filed 2011·Granted Sep 2, 2014·15 cites·10 claims
- 2195US7411191B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2007·Granted Aug 12, 2008·20 cites·4 claims
- 2294US7312449B2Electron beam system and method of manufacturing devices using the systemEBARA CORP·Filed 2005·Granted Dec 25, 2007·20 cites·9 claims
- 2394US7256405B2Sample repairing apparatus, a sample repairing method and a device manufacturing method using the same methodEBARA CORP·Filed 2005·Granted Aug 14, 2007·21 cites·17 claims
- 2494US7241993B2Inspection system by charged particle beam and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jul 10, 2007·54 cites·12 claims
- 2594US7095022B2Electron beam apparatus and method of manufacturing semiconductor device using the apparatusNIKON CORP·Filed 2001·Granted Aug 22, 2006·48 cites·13 claims
- 2694US5981947AApparatus for detecting or collecting secondary electrons, charged-particle beam exposure apparatus comprising same, and related methodsNIKON CORP·Filed 1998·Granted Nov 9, 1999·94 cites·55 claims
- 2793US7928378B2Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using formerEBARA CORP·Filed 2008·Granted Apr 19, 2011·17 cites·11 claims
- 2893US7425703B2Electron beam apparatus, a device manufacturing method using the same apparatus, a pattern evaluation method, a device manufacturing method using the same method, and a resist pattern or processed wafer evaluation methodEBARA CORP·Filed 2005·Granted Sep 16, 2008·16 cites·3 claims
- 2993US7408175B2Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using formerEBARA CORP·Filed 2007·Granted Aug 5, 2008·19 cites·9 claims
- 3093US7005641B2Electron beam apparatus and a device manufacturing method by using said electron beam apparatusEBARA CORP·Filed 2003·Granted Feb 28, 2006·35 cites·9 claims
- 3193US6087667ACharged-particle-beam (CPB) lithography apparatus, evaluation method, and CPB sourceNIKON CORP·Filed 1997·Granted Jul 11, 2000·78 cites·38 claims
- 3292US7829871B2Sheet beam-type testing apparatusEBARA CORP·Filed 2008·Granted Nov 9, 2010·10 cites·7 claims
- 3392US6125522AManufacturing method for electrostatic deflectorNIKON CORP·Filed 1996·Granted Oct 3, 2000·79 cites·16 claims
- 3492US6087046AMethods for forming microlithographic masks that compensate for proximity effectsNIKON CORP·Filed 1998·Granted Jul 11, 2000·79 cites·19 claims
- 3592US5831270AMagnetic deflectors and charged-particle-beam lithography systems incorporating sameNIKON CORP·Filed 1997·Granted Nov 3, 1998·79 cites·32 claims
- 3691US8053726B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Nov 8, 2011·11 cites·11 claims
- 3791US7129485B2Electron beam apparatus and method of manufacturing semiconductor device using the apparatusEBARA CORP·Filed 2004·Granted Oct 31, 2006·30 cites·8 claims
- 3890US8803103B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2013·Granted Aug 12, 2014·6 cites·7 claims
- 3990US7247848B2Electron beam apparatus and method of manufacturing semiconductor device using the apparatusEBARA CORP·Filed 2003·Granted Jul 24, 2007·28 cites·16 claims
- 4090US7109484B2Sheet beam-type inspection apparatusEBARA CORP·Filed 2004·Granted Sep 19, 2006·23 cites·6 claims
- 4189US7157703B2Electron beam systemEBARA CORP·Filed 2003·Granted Jan 2, 2007·29 cites·33 claims
- 4289US5770863ACharged particle beam projection apparatusNIKON CORP·Filed 1996·Granted Jun 23, 1998·62 cites·21 claims
- 4388US7888642B2Electron beam apparatus and method of manufacturing semiconductor device using the apparatusEBARA CORP·Filed 2008·Granted Feb 15, 2011·9 cites·9 claims
- 4487US7423267B2Electron beam apparatus and method of manufacturing semiconductor device using the apparatusEBARA CORP·Filed 2006·Granted Sep 9, 2008·8 cites·5 claims
- 4587US6853143B2Electron beam system and method of manufacturing devices using the systemEBARA CORP·Filed 2003·Granted Feb 8, 2005·23 cites·20 claims
- 4686US6140021ACharged particle beam transfer methodNAKASUJI MAMORU·Filed 1999·Granted Oct 31, 2000·51 cites·20 claims
- 4785US7408643B2Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samplesEBARA CORP·Filed 2007·Granted Aug 5, 2008·12 cites·7 claims
- 4884US5747819ACharged particle beam transfer device exhibiting low aberrationNIKON CORP·Filed 1996·Granted May 5, 1998·44 cites·20 claims
- 4983US8368031B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2011·Granted Feb 5, 2013·3 cites·7 claims
- 5083US8067732B2Electron beam apparatusNAKASUJI MAMORU·Filed 2006·Granted Nov 29, 2011·8 cites·4 claims
Showing the top 50 of 145 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →