Inventor · disambiguated record
Marc Nicolet
Also filed as: NICOLET MARC · NICOLET MARC-A · NICOLET MARC-AURELE
9 granted patents·1 pending application·421 citations·filing 1975–2004
91Inventor score
Top patents by PatentIndex Score
10 records- 0193US5622893AMethod of forming conductive noble-metal-insulator-alloy barrier layer for high-dielectric-constant material electrodesTEXAS INSTRUMENTS INC·Filed 1994·Granted Apr 22, 1997·86 cites·14 claims
- 0292US5729054AConductive noble-metal-insulator-alloy barrier layer for high-dielectric-constant material electrodesTEXAS INSTRUMENTS INC·Filed 1995·Granted Mar 17, 1998·94 cites·14 claims
- 0389US5696018AMethod of forming conductive noble-metal-insulator-alloy barrier layer for high-dielectric-constant material electrodesTEXAS INSTRUMENTS INC·Filed 1995·Granted Dec 9, 1997·74 cites·17 claims
- 0483US5916634AChemical vapor deposition of W-Si-N and W-B-NSANDIA CORP·Filed 1996·Granted Jun 29, 1999·81 cites·12 claims
- 0577US4478881ATungsten barrier contactSOLID STATE DEVICES INC·Filed 1981·Granted Oct 23, 1984·29 cites·7 claims
- 0662US5997949ASynthesis of W-Si-N films by chemical vapor deposition using WF6, SiH4 and NH3CALIFORNIA INST OF TECHN·Filed 1996·Granted Dec 7, 1999·25 cites·15 claims
- 0761US4012235ASolid phase epitaxial growthCALIFORNIA INST OF TECHN·Filed 1975·Granted Mar 15, 1977·20 cites·6 claims
- 0836US6114256AStable metallization for diamond and other materialsCALIFORNIA INST OF TECHN·Filed 1995·Granted Sep 5, 2000·10 cites·18 claims
- 0934US6723436B1Electrically conducting ternary amorphous fully oxidized materials and their applicationCALIFORNIA INST OF TECHN·Filed 2000·Granted Apr 20, 2004·2 cites·5 claims
- 1029US2004197983A1Electrically conducting ternary amorphous fully oxidized materials and their applicationCALIFORNIA INST OF TECHN·Filed 2004·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Marc Nicolet files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →