Inventor · disambiguated record
Masashi Ogiwara
Also filed as: OGIWARA MASASHI
7 granted patents·1 pending application·10 citations·filing 2007–2022
75Inventor score
Top patents by PatentIndex Score
8 records- 0178US8586289B2Aromatic hydrocarbon resin and composition for forming underlayer film for lithographyIDENO RYUJI·Filed 2010·Granted Nov 19, 2013·5 cites·11 claims
- 0275US8592134B2Composition for forming base film for lithography and method for forming multilayer resist patternOGURO DAI·Filed 2008·Granted Nov 26, 2013·5 cites·18 claims
- 0359US8563665B2Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compoundKITA SEIJI·Filed 2008·Granted Oct 22, 2013·0 cites·7 claims
- 0457US8524952B2Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compoundKITA SEIJI·Filed 2012·Granted Sep 3, 2013·0 cites·2 claims
- 0557US8519177B2Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compoundKITA SEIJI·Filed 2012·Granted Aug 27, 2013·0 cites·2 claims
- 0657US2025002632A1Resin, method for producing resin, curable resin composition, and cured productMITSUBISHI GAS CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0751US8648152B2Polyfunctional dimethylnaphthalene formaldehyde resin, and process for production thereofKITA SEIJI·Filed 2008·Granted Feb 11, 2014·0 cites·22 claims
- 0847US7772331B2Method of producing low viscosity phenol-modified aromatic hydrocarbon formaldehyde resinMITSUBISHI GAS CHEMICAL CO·Filed 2007·Granted Aug 10, 2010·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →