Inventor · disambiguated record
Masaru Ohto
Also filed as: OHTO MASARU
10 granted patents·11 pending applications·39 citations·filing 1990–2013
85Inventor score
Top patents by PatentIndex Score
21 records- 0187US7572758B2Cleaning liquid and cleaning methodMITSUBISHI GAS CHEMICAL CO·Filed 2005·Granted Aug 11, 2009·13 cites·11 claims
- 0278US9422512B2Cleaning liquid for semiconductor elements and cleaning method using sameMITSUBISHI GAS CHEMICAL CO·Filed 2013·Granted Aug 23, 2016·4 cites·9 claims
- 0367US7977292B2Cleaning composition and process for producing semiconductor deviceMITSUBISHI GAS CHEMICAL CO·Filed 2008·Granted Jul 12, 2011·3 cites·5 claims
- 0465US9196472B2Processing liquid for suppressing pattern collapse of fine metal structure, and method for producing fine metal structure using sameOHTO MASARU·Filed 2010·Granted Nov 24, 2015·2 cites·16 claims
- 0563US9587208B2Cleaning liquid composition, method for cleaning semiconductor element, and method for manufacturing semiconductor elementMITSUBISHI GAS CHEMICAL CO·Filed 2013·Granted Mar 7, 2017·1 cites·6 claims
- 0658US6475373B1Method of controlling NOx gas emission by hydrogen peroxideMITSUBISHI GAS CHEMICAL CO·Filed 2000·Granted Nov 5, 2002·2 cites·8 claims
- 0745US8980812B2Treatment liquid for inhibiting pattern collapse in microstructures, and microstructure manufacturing method using said treatment liquidMATSUNAGA HIROSHI·Filed 2011·Granted Mar 17, 2015·0 cites·17 claims
- 0845US5185185AProcess of pretreatment of metal-plating resin molded articlesMITSUBISHI GAS CHEMICAL CO·Filed 1990·Granted Feb 9, 1993·14 cites·7 claims
- 0943US2007099810A1Cleaning liquid and cleaning methodMATSUNAGA HIROSHI·Filed 2005·Application pending·0 cites
- 1042US2004029753A1Resist stripping liquid containing fluorine compoundFiled 2003·Application pending·0 cites
- 1138US2004188385A1Etching agent composition for thin films having high permittivity and process for etchingFiled 2004·Application pending·0 cites
- 1237US9334161B2Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using sameOHTO MASARU·Filed 2010·Granted May 10, 2016·0 cites·14 claims
- 1337US8658053B2Etching composition for metal material and method for manufacturing semiconductor device by using sameYAGUCHI KAZUYOSHI·Filed 2006·Granted Feb 25, 2014·0 cites·16 claims
- 1437US2004224866A1Cleaning solution and cleaning process using the solutionFiled 2004·Application pending·0 cites
- 1536US2013171828A1Processing liquid for suppressing pattern collapse of microstructure, and method for producing microstructure using sameMATSUNAGA HIROSHI·Filed 2011·Application pending·0 cites
- 1636US2013161284A1Treatment liquid for inhibiting pattern collapse in microstructures, and microstructure manufacturing method using said treatment liquidMATSUNAGA HIROSHI·Filed 2011·Application pending·0 cites
- 1735US2003148624A1Method for removing resistsFiled 2003·Application pending·0 cites
- 1835US2010051066A1Composition for removing residue from wiring board and cleaning methodKUWABARA EIKO·Filed 2006·Application pending·0 cites
- 1935US2004256358A1Method for releasing resistFiled 2002·Application pending·0 cites
- 2033US2012214722A1Treatment solution for preventing pattern collapse in metal fine structure body, and process for production of metal fine structure body using sameOHTO MASARU·Filed 2010·Application pending·0 cites
- 2133US2012205345A1Treatment solution for preventing pattern collapse in metal fine structure body, and process for production of metal fine structure body using sameOHTO MASARU·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →