Inventor · disambiguated record
Masami Oikawa
Also filed as: OIKAWA MASAMI
16 granted patents·8 pending applications·46 citations·filing 1999–2025
89Inventor score
Top patents by PatentIndex Score
24 records- 0189US11894249B2Control device, processing apparatus, and control methodTOKYO ELECTRON LTD·Filed 2020·Granted Feb 6, 2024·2 cites·13 claims
- 0275US11534805B2Cleaning method and processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Dec 27, 2022·0 cites·12 claims
- 0373US11745231B2Cleaning method and processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Sep 5, 2023·0 cites·2 claims
- 0472US7611926B2Thermosetting die bonding filmNITTO DENKO CORP·Filed 2008·Granted Nov 3, 2009·6 cites·15 claims
- 0568US2025333841A1Film forming apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0664US12017261B2Processing apparatus and cleaning processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Jun 25, 2024·0 cites·9 claims
- 0764USD791721SWafer boatTOKYO ELECTRON LTD·Filed 2015·Granted Jul 11, 2017·11 cites·1 claims
- 0862USD789310SWafer boatTOKYO ELECTRON LTD·Filed 2015·Granted Jun 13, 2017·10 cites·1 claims
- 0960US2024175127A1Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1059US11486041B2Film forming apparatus, control device, and pressure gauge adjustment methodTOKYO ELECTRON LTD·Filed 2020·Granted Nov 1, 2022·0 cites·13 claims
- 1157US12252786B2Cleaning method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Mar 18, 2025·0 cites·12 claims
- 1255US11926891B2Cleaning method and processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Mar 12, 2024·0 cites·8 claims
- 1351USD772183SWafer boatTOKYO ELECTRON LTD·Filed 2015·Granted Nov 22, 2016·6 cites·1 claims
- 1449US11538678B2Deposition methodTOKYO ELECTRON LTD·Filed 2020·Granted Dec 27, 2022·0 cites·10 claims
- 1548USD769201SWafer boatTOKYO ELECTRON LTD·Filed 2015·Granted Oct 18, 2016·5 cites·1 claims
- 1646US2023326762A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1746US2023096299A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1843US10256162B2Substrate processing system, control device, and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Apr 9, 2019·0 cites·8 claims
- 1942US8592260B2Process for producing a semiconductor deviceOIKAWA MASAMI·Filed 2009·Granted Nov 26, 2013·0 cites·15 claims
- 2042US2019228992A1Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2141US2019309420A1Substrate Processing Apparatus and Substrate Processing MethodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2236US2017233866A1Film Forming Apparatus, Film Forming Method, and Computer-Readable Storage MediumTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 2335US6400461B1Image forming methodTOSHIBA TEC KK·Filed 1999·Granted Jun 4, 2002·6 cites·9 claims
- 2434US2016265107A1Substrate holder and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →