Inventor · disambiguated record
Markus Schultheis
Also filed as: SCHULTHEIS MARKUS
6 granted patents·9 pending applications·9 citations·filing 2002–2020
73Inventor score
Files withHERAEUS GMBH W C5HERAEUS DEUTSCHLAND GMBH & CO KG4MATERION ADVANCED MAT GERMANY GMBH3HERAEUS MATERIALS TECH GMBH1JUETTNER MARC1
Top patents by PatentIndex Score
15 records- 0174US10347472B2Zirconium oxide based sputtering targetMATERION ADVANCED MAT GERMANY GMBH·Filed 2017·Granted Jul 9, 2019·1 cites·13 claims
- 0268US10487392B2Double-layer system comprising a partially absorbing layer, and method and sputter target for producing said layerHERAEUS DEUTSCHLAND GMBH & CO KG·Filed 2015·Granted Nov 26, 2019·1 cites·11 claims
- 0359US11566320B2NiW(X) sputtering target with improved structureMATERION ADVANCED MAT GERMANY GMBH·Filed 2020·Granted Jan 31, 2023·0 cites·6 claims
- 0459US8496288B2Outer side wall structure, outer side wall module, and side wall for a motor vehicleJUETTNER MARC·Filed 2012·Granted Jul 30, 2013·5 cites·10 claims
- 0552US2009277777A1Cold-pressed sputter targetsHERAEUS GMBH W C·Filed 2007·Application pending·0 cites
- 0651US2016070033A1Light-absorbing layer and layer system containing the layer, method for producing the layer system and a sputter target suited thereforHERAEUS DEUTSCHLAND GMBH & CO KG·Filed 2014·Application pending·0 cites
- 0751US2008187453A1Material mixture, sputter target and method for producing a sputter targetHERAEUS GMBH W C·Filed 2008·Application pending·0 cites
- 0850US2007240981A1Sputter Target With High-Melting PhaseHERAEUS GMBH W C·Filed 2007·Application pending·0 cites
- 0948US2009250337A1Tubular target having a connecting layer arranged between the target tube and the carrier tubeHERAEUS GMBH W C·Filed 2005·Application pending·0 cites
- 1046US8974707B2Planar or tubular sputtering target and method for the production thereofHERAEUS MATERIALS TECH GMBH·Filed 2013·Granted Mar 10, 2015·0 cites·13 claims
- 1142US2006151320A1Tubular sputtering targetWEIGERT MARTIN·Filed 2005·Application pending·0 cites
- 1241US2020002235A1Cylindrical titanium oxide sputtering target and process for manufacturing the sameMATERION ADVANCED MAT GERMANY GMBH·Filed 2018·Application pending·0 cites
- 1338US2019161829A1PROCESS FOR PREPARATION OF THE INTERMETALLIC COMPOUND Nb3Sn BY MELT METALLURGICAL PROCEDUREHERAEUS DEUTSCHLAND GMBH & CO KG·Filed 2018·Application pending·0 cites
- 1437US7431808B2Sputter target based on titanium dioxideHERAEUS GMBH W C·Filed 2002·Granted Oct 7, 2008·2 cites·7 claims
- 1530US2017062193A1CuSn, CuZn AND Cu2ZnSn SPUTTER TARGETSHERAEUS DEUTSCHLAND GMBH & CO KG·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →